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Development of a Heater Structure Based on ITO Films Deposited by RF Magnetron Sputtering for Chip-scale Atomic Clock

机译：基于ITO胶片沉积的加热器结构的开发，RF磁控溅射芯片尺寸原子钟

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Zhong-Shan Zhang; Liang Tang; Qing-Yun Ju; Lei Ji; Meng-Hui Zhi; Dong-Hai Qiao;
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1. Effects of film thickness and sputtering power on properties of ITO thin films deposited by RF magnetron sputtering without oxygen [J] . Amalraj Peter Amalathas, Maan M. Alkaisi Journal of materials science . 2016,第10期

机译：膜厚和溅射功率对无氧RF磁控溅射沉积ITO薄膜性能的影响
2. Atomic composition, structure, and electrical properties of In_(1-x)Ga_xSb films deposited by magnetron sputtering [J] . Giulian Raquel, Bolzan Charles A., Rossetto Leandro T., Thin Solid Films . 2020,第Sepa1期

机译：由磁控溅射沉积的IN_（1-X）GA_XSB膜的原子组成，结构和电性能
3. Microstructure and Electrical Properties of Antimony Telluride Thin Films Deposited by RF Magnetron Sputtering on Flexible Substrate Using Different Sputtering Pressures [J] . Khumtong T., Sukwisute P., Sakulkalavek A., Journal of Electronic Materials . 2017,第5期

机译：使用不同溅射压力在柔性基板上沉积的抗碲化酰胺薄膜的微观结构和电性能
4. Development of a Heater Structure Based on ITO Films Deposited by RF Magnetron Sputtering for Chip-scale Atomic Clock [C] . Zhong-Shan ZHANG, Liang TANG, Qing-Yun JU, Annual International Conference on Advanced Material Engineering . 2016

机译：基于ITO胶片沉积的加热器结构的开发，RF磁控溅射芯片尺寸原子钟
5. The effect of the sputtering parameters on the ITO films deposited by RF magnetron sputtering [D] . Jung, Jihoon. 2011

机译：溅射参数对RF磁控溅射沉积ITO膜的影响
6. Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering [O] . Asif Majeed, Jie He, Lingrui Jiao, 2015

机译：射频磁控溅射沉积纳米结构TiO2薄膜的表面性质和生物相容性
7. Comparative study of laser induced periodic surface structures formed on pulsed laser deposited and magnetron sputtered titanium oxide films [O] . A. Talbi, P. Coddet, M. Tabbal, 2019

机译：在脉冲激光沉积和磁控溅射钛氧化物膜上形成的激光诱导周期表面结构的比较研究

Development of a Heater Structure Based on ITO Films Deposited by RF Magnetron Sputtering for Chip-scale Atomic Clock

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