首页> 外文OA文献 >Effect of Plasma Enhanced Chemical Vapor Deposition of Tetraethylorthosilicate on the Friction and Wear Loss of Plasma Electrolytic Oxidized Aluminum 6082

【2h】

Effect of Plasma Enhanced Chemical Vapor Deposition of Tetraethylorthosilicate on the Friction and Wear Loss of Plasma Electrolytic Oxidized Aluminum 6082

机译：四乙基硅酸盐等离子体增强化学气相沉积对等离子体电解氧化铝的摩擦和磨损损失6082的影响

代理获取

本网站仅为用户提供外文OA文献查询和代理获取服务，本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文，但由于OA文献来源多样且变更频繁，仍可能出现获取不到、文献不完整或与标题不符等情况，如果获取不到我们将提供退款服务。请知悉。

页面导航

著录项
引文网络
相似文献
相关主题

著录项

作者
Ahmad R Rastkar;
展开▼
作者单位

展开▼
年度 2015
总页数
原文格式 PDF
正文语种
中图分类

相似文献

外文文献
中文文献
专利

1. Effect of Plasma Enhanced Chemical Vapor Deposition of Tetraethylorthosilicate on the Friction and Wear Loss of Plasma Electrolytic Oxidized Aluminum 6082 [J] . Ahmad R Rastkar Chemical and Materials Engineering . 2015,第2期

机译：等离子体增强原硅酸四乙酯的化学气相沉积对等离子体电解氧化铝6082摩擦磨损的影响
2. Plasma enhanced chemical vapor deposition of tetraethylorthosilicate and hexamethyldisiloxane on polyester fabrics under pulsed and continuous wave discharge [J] . Kale K.H., Palaskar S.S. Journal of Applied Polymer Science . 2012,第5期

机译：在脉冲和连续波放电下等离子增强聚酯纤维上的原硅酸四乙酯和六甲基二硅氧烷的化学气相沉积
3. Improvements in Electrical Characteristics of Plasma Enhanced Chemical Vapor Deposition-Tetraethylorthosilicate-SiO_2 by Atomic Hydrogen Passivation via Hot-Wire Technique [J] . Cheolhyun Lim, Junichi Hanna Japanese Journal of Applied Physics. Part 2, Letters & Express Letters . 2006,第46a50期

机译：热线技术通过原子氢钝化改善等离子体增强化学气相沉积-原硅酸四乙酯-SiO_2的电特性
4. Photosensitivity in boron-codoped germanosilicate films formed by tetraethylorthosilicate plasma enhanced chemical vapor deposition method without hydrogen loading [C] . Hajime Takeya, Sadayuki Matsumoto, Kiichi Yoshiara, Topical meeting on bragg gratings, photosensitivity, and poling in glass waveguides . 2000

机译：通过四乙酯硅酸盐等离子体增强的化学气相沉积方法形成的硼编排锗硅酸盐膜的光敏性，无需氢负载
5. An in situ x-ray photoelectron spectroscopy analysis of thin films created through physical vapor deposition of aluminum and plasma enhanced chemical vapor deposition of trimethylsilane. [D] . Scott, Paul Robert, Jr. 2007

机译：通过铝的物理气相沉积和等离子体增强的三甲基硅烷化学气相沉积产生的薄膜的原位X射线光电子能谱分析。
6. Synthesis and Mechanical Wear Studies of Ultra Smooth Nanostructured Diamond (USND) Coatings Deposited by Microwave Plasma Chemical Vapor Deposition with He/H2/CH4/N2 Mixtures [O] . S. Chowdhury, J. Borham, S. A. Catledge, -1

机译：He / H2 / CH4 / N2混合物的微波等离子体化学气相沉积法沉积超光滑纳米结构金刚石（USND）涂层的合成及机械磨损研究
7. Excellent Passivation of n ‐Type Silicon Surfaces Enabled by Pulsed‐Flow Plasma‐Enhanced Chemical Vapor Deposition of Phosphorus Oxide Capped by Aluminum Oxide [O] . Jimmy Melskens, Roel J. Theeuwes, Lachlan E. Black, 2020

机译：通过氧化铝覆盖的磷脂含磷氧化物的脉冲流等离子体增强的化学气相沉积优异的硅表面钝化钝化硅表面

Effect of Plasma Enhanced Chemical Vapor Deposition of Tetraethylorthosilicate on the Friction and Wear Loss of Plasma Electrolytic Oxidized Aluminum 6082

著录项

引文网络

相似文献

相关主题

期刊订阅