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SIMS characterization of amorphous silicon germanium alloys grown by hot-wire deposition

机译：热线沉积种植的非晶硅锗合金的SIMS表征

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R. C. Reedy; A. R. Mason; B. P. Nelson; Y. Xu;
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年度 1999
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1. Junction capacitance study of an oxygen impurity defect exhibiting configuration relaxation in amorphous silicon-germanium alloys deposited by hot-wire CVD [J] . Datta S, Cohen JD, Xu YQ, Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites . 2008,第19a25期

机译：热线CVD沉积的非晶硅锗合金中氧杂质缺陷表现出构型弛豫的结电容研究
2. Grazing incidence x-ray diffraction and atomic force microscopy investigations of germanium dots grown on silicon (001) by successive depositions of germanium through a thin silicon oxide layer [J] . M. Derivaz, P. Noe, R. Dianoux, Applied Physics Letters . 2004,第17期

机译：通过薄薄的氧化硅层连续沉积锗而在硅（001）上生长的锗点的掠入射x射线衍射和原子力显微镜研究
3. Monte Carlo simulations on large-area deposition of amorphous silicon by hot-wire CVD [J] . Pfluger A., Schroder B., Bart HJ. Thin Solid Films . 2003,第1a2期

机译：热线CVD对非晶硅大面积沉积的蒙特卡罗模拟
4. SIMS Characterization of Amorphous Silicon Germanium Alloys Grown by Hot-Wire Deposition [C] . R.C. Reedy, A.R. Mason, B.P. Nelson, Conference on NCPV photovoltaics program review . 1999

机译：热线沉积种植的非晶硅锗合金的SIMS表征
5. THE EFFECT OF DEPOSITION CONDITIONS ON THE STRUCTURAL, OPTOELECTRONIC AND DEVICE PROPERTIES OF HYDROGENATED AMORPHOUS SILICON AND SILICON-GERMANIUM ALLOYS (SOLAR CELL, THIN FILM TRANSISTORS). [D] . YAN, PHILIP YU. 1987

机译：沉积条件对氢化非晶硅和硅锗合金（太阳能电池，薄膜晶体管）的结构，光电和器件性能的影响。
6. Characterization of dislocations in germanium layers grown on (011)- and (111)-oriented silicon by coplanar and noncoplanar X-ray diffraction [O] . Andrei Benediktovitch, Alexei Zhylik, Tatjana Ulyanenkova, -1

机译：通过共面和非共面X射线衍射表征在（011）和（111）取向硅上生长的锗层中的位错
7. Comparative anomalous small-angle x-ray scattering study of hotwire and plasma grown amorphous silicon–germanium alloys [O] . Goerigk, G., Williamson, D. L. 2001

机译：热丝和等离子体生长的非晶硅锗合金的比较小角度异常X射线散射研究

SIMS characterization of amorphous silicon germanium alloys grown by hot-wire deposition

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