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Multilayer, Stacked Spiral Copper Inductors on Silicon with Micro-Henry Inductance Using Single-Level Lithography

机译:多层,用单级光刻的微亨利电感硅堆叠螺旋铜电感器

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摘要

We present copper structures composed of multilayer, stacked inductors (MLSIs) with tens of micro-Henry inductance for use in low frequency (sub 100 MHz), power converter technology. Unique to this work is the introduction of single-level lithography over the traditional two-level approach to create each inductor layer. The result is a simplified fabrication process which results in a reduction in the number of lithography steps per inductor (metal) layer and a reduction in the necessary alignment precision. Additionally, we show that this fabrication process yields strong adhesion amongst the layers, since even after a postprocess abrasion technique at the inner diameter of the inductors, no shearing occurs and connectivity is preserved. In total, three separate structures were fabricated using the single-level lithography approach, each with a three-layered, stacked inductor design but with varied geometries. Measured values for each of the structures were extracted, and the following results were obtained: inductance values of 24.74, 17.25, and 24.74 μH, self-resonances of 9.87, 5.72, and 10.58 MHz, and peak quality factors of 2.26, 2.05, and 4.6, respectively. These values are in good agreement with the lumped parameter model presented.
机译:多层构成我们本发明的铜的结构,层叠电感器(MLSIs)数十微亨电感的用于低频率(子100兆赫),功率转换器技术使用。这项工作的独特是通过传统的两级方法引入单级光刻来创建每个电感层。结果是简化的制造过程,其导致每个电感器(金属)层的光刻步骤数量的减少和必要的对准精度的降低。另外,我们表明,该制造过程在层之间产生强粘附,因为即使在电感器的内径处的后处理磨损技术之后,不会发生剪切,并且保持连接。总共使用单级光刻方法制造三个单独的结构,每个结构具有三层堆叠电感器设计,但具有变化的几何形状。提取用于每个结构的测量值,并且获得下列结果:24.74,17.25电感值,和24.74μH,9.87,5.72的自谐振,和10.58兆赫,和峰品质因子2.26,2.05,和4.6分别。这些值与呈现的集总参数模型很好。

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