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Fifteen Nanometer Resolved Patterns in Selective Area Atomic Layer DepositionDefectivity Reduction by Monolayer Design

机译：十五纳米分辨图案在单层设计中的选择性区域原子层沉积缺陷

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1. Fifteen Nanometer Resolved Patterns in Selective Area Atomic Layer Deposition-Defectivity Reduction by Monolayer Design [J] . Wojtecki Rudy, Mettry Magi, Nathel Noah F. Fine, ACS applied materials & interfaces . 2018,第44期

机译：十五纳米分辨图案在单层设计中的选择性区域原子层沉积缺陷缺陷
2. Catalytic reduction of nitro-group terminated monolayers by Ag nanoparticles; a novel strategy for site-selective patterning of organic monolayers [J] . Yeoung Uk Seo, Seung Joon Lee, Kwan Kim Chemical Communications . 2004,第6期

机译：Ag纳米颗粒催化还原硝基终止的单分子膜；一种新的有机单层位点选择性构图策略
3. Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer Deposition [J] . Liu Tzu-Ling, Nardi Katie L., Draeger Nerissa, ACS applied materials & interfaces . 2020,第37期

机译：多层与单层十二烷硫醇对面积选择原子层沉积选择性和图案完整性的影响
4. SELECTIVE ATOMIC LAYER DEPOSITION OF TITANIUM OXIDE ON SILICON AND GOLD WITH PATTERNED SELF-ASSEMBLED MONOLAYERS [C] . Myung M. Sung Proceedings vol.2005-09; European Conference on Chemical Vapor Deposition(EURCVD-15); 20050905-09; Bochum(DE) . 2005

机译：带有自组装单分子膜的硅和金上氧化钛的选择性原子层沉积
5. Fabrication and characterization of nanometer-sized protein patterns using atomic force microscopy and selective immobilization [D] . Wadu-Mesthrige, Kapila Kithsiri. 2000

机译：使用原子力显微镜和选择性固定技术制备和表征纳米级蛋白质图案
6. Crystallographic order and decomposition of MnIII6CrIII3+ single-molecule magnets deposited in submonolayers and monolayers on HOPG studied by means of molecular resolved atomic force microscopy (AFM) and Kelvin probe force microscopy in UHV [O] . Aaron Gryzia, Timm Volkmann, Armin Brechling, 2014

机译：分子分辨原子力显微镜（AFM）和开尔文探针力显微镜研究了HOPG上亚单层和单层中MnIII6CrIII 3+单分子磁体的结晶顺序和分解
7. Nanometer scale friction and wear on self-assembled monolayers investigated by atomic force microscopy [O] . Kopta Susanne 2001

机译：通过原子力显微镜在自组装单层上进行纳米级摩擦和磨损
8. Nanometer-scale electrochemical patterning of LiMn2O4 surfaces by an atomic force microscope operating in air [R] . 2001

机译：通过在空气中操作的原子力显微镜对Limn2O4表面进行纳米级电化学图案化

Fifteen Nanometer Resolved Patterns in Selective Area Atomic Layer DepositionDefectivity Reduction by Monolayer Design

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