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Optical constants and thickness determination of very thin amorphous semiconductor films

机译:光学常数和厚度测定非常薄的非晶半导体膜

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摘要

This contribution addresses the relevant question of retrieving, from transmittance data, the optical constants, and thickness of very thin semiconductor and dielectric films. The retrieval process looks for a thickness that, subject to the physical input of the problem, minimizes the difference between the measured and the theoretical spectra. This is a highly underdetermined problem but, the use of approximate-though simple-functional dependencies of the index of refraction and of the absorption coefficient on photon energy, used as an a priori information, allows surmounting the ill posedness of the problem. The method is illustrated with the analysis of transmittance data of very thin amorphous silicon films. The method enables retrieval of physically meaningful solutions for films as thin as 300 A. The estimated parameters agree well with known data or with optical parameters measured by independent methods. The limitations of the adopted model and the shortcomings of the optimization algorithm are presented and discussed. (C) 2002 American Institute of Physics.
机译:这种贡献的地址检索,从透射率数据,所述光学常数,和非常薄的半导体和电介质膜的厚度的相关问题。检索过程寻找一个厚度,受该问题的物理输入,最小化所测量的和理论光谱之间的差异。这是一个高度欠定的问题,但,使用的折射和光子能量吸收系数的指数近似-虽然简单官能依赖性,作为先验信息,允许克服该问题的不适定性。该方法被示出具有非常薄的无定形硅膜的透射率数据的分析。该方法使检索物理意义的解决方案的用于膜薄至300 A的估计的参数与已知数据或与由独立的方法测量的光学参数吻合。所采用的模型和优化算法的缺点限制了介绍和讨论。 (c)2002年美国物理研究所。

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