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UV-Photografting Modification of NF Membrane Surface for NOM wfouling Reductionud

机译:NF膜表面的紫外光接枝改性以减少NOM结垢 ud

摘要

Fouling of natural organic matter is one of the common problems in water treatment plant. Despite physical and chemical treatment normally used to recover the flux loss, membrane surface properties also not less important to be considered. In this study, UV-photografting technique was applied to modify commercial nanofiltration (NF) membrane surface in order to reduce fouling tendency. Neutral hydrophilic N-vinylpyrrolidone has been chosen as the monomer for the UV-photografting. The result revealed that the grafted membrane at optimum conditions exhibits low humic acid fouling tendency compared with the unmodifiedudmembrane. In addition, both the unmodified and the UV-grafted polyethersulfone NF membranes were characterized in terms of structural properties (pore size, rp, and ratio of membrane thickness to porosity, Dx/Ak) using Pore Model in order to evaluate the effect of UV-photografting modification on structural parameters and indirectly influence the membrane performance and fouling as well.udud
机译:天然有机物的结垢是水处理厂的常见问题之一。尽管通常使用物理和化学处理来恢复通量损失,但膜的表面性能也同样重要。在这项研究中,紫外光接枝技术被用于修饰商业纳滤(NF)膜表面,以减少结垢的趋势。已选择中性亲水性N-乙烯基吡咯烷酮作为UV光接枝的单体。结果表明,与未改性的膜相比,在最佳条件下的接枝膜表现出较低的腐殖酸结垢趋势。此外,为了评估紫外线的影响,使用孔模型对未改性和紫外接枝的聚醚砜NF膜的结构性质(孔径,rp和膜厚与孔隙率之比,Dx / Ak)进行了表征。 -光接枝修饰结构参数,并间接影响膜性能和结垢。 ud ud

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