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Ion Energy Distribution in Midium-Vacuum Arc Plasma for Processing the Titanium Nitride Film

机译：用于加工钛氮化钛膜的中美真空电弧等离子体中的离子能量分布

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Mamoru Sakaki; Motohisa Kondo; Tateki Sakakibara;
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年度 1991
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机译：PVD和等离子渗氮工艺沉积在Ti-6Al-4V合金上的氮化钛薄膜的滑动磨损
2. Growth and characteristics of diamond-like carbon films with titanium and titanium nitride functional layers by cathode arc plasma [J] . Zhou B., Jiang X., Rogachev A.V., Surface & Coatings Technology . 2013,第Null期

机译：阴极电弧等离子体生长具有钛和氮化钛功能层的类金刚石碳膜及其特性
3. Competing growth of titanium nitrides and silicides in Ti thin films processed in expanding microwave plasma: Morphology and microstructural properties [J] . Isabelle Jauberteau, Pierre Carles, Richard Mayet, AIP Advances . 2018,第9期

机译：在扩展的微波等离子体中处理的钛薄膜中氮化钛和硅化物的竞争性生长：形貌和微观结构性质
4. THE INFLUENCE OF PARTICLE ENERGY DISTRIBUTIONS ON THE STRUCTURE AND PROPERTIES OF REACTIVELY SPUTTERED TITANIUM OXIDE AND TITANIUM NITRIDE THIN FILMS [C] . C. Muratore, J.A. Rees, B. Mishra, 2003 TMS Annual Meeting, Mar 2-6, 2003, San Diego, California . 2003

机译：颗粒能量分布对反应溅射二氧化钛和氮化钛薄膜结构和性能的影响
5. Effect of plasma energy, plasma power, working distance, and inert gas pressure on composition of sputtered thermoelastic titanium-nickel thin films. [D] . Lee, Jiun-Chung. 1994

机译：等离子体能量，等离子体功率，工作距离和惰性气体压力对溅射热弹性钛镍薄膜组成的影响。
6. Thickness Influence on In Vitro Biocompatibility of Titanium Nitride Thin Films Synthesized by Pulsed Laser Deposition [O] . Liviu Duta, George E. Stan, Adrian C. Popa, 2016

机译：厚度对脉冲激光沉积合成氮化钛薄膜体外生物相容性的影响
7. Competing growth of titanium nitrides and silicides in Ti thin films processed in expanding microwave plasma: Morphology and microstructural properties [O] . Isabelle Jauberteau, Pierre Carles, Richard Mayet, 2018

机译：在膨胀微波血浆中加工的Ti薄膜中竞争氮化钛和硅化物的竞争：形态学和微观结构性质
8. Plasma-Assisted Synthesis and Physical Chemical Characterization of Titanium Nitride Films [R] . Hilton, M. R. 1987

机译：氮化钛薄膜的等离子体辅助合成及物理化学表征

Ion Energy Distribution in Midium-Vacuum Arc Plasma for Processing the Titanium Nitride Film

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