Design and Fabrication of Moth-Eye Subwavelength Structure with a Waist on Silicon for Broadband and Wide-Angle Anti-Reflection Property

摘要

Reflection loss on the optical component surface is detrimental to performance. Several researchers have discovered that the eyes of moths are covered with micro- and nanostructured films that reduce broadband and wide-angle light reflection. This research proposes a new type of moth-eye subwavelength structure with a waist, which is equivalent to a gradient refractive index film layer with high–low–high hyperbolic-type fill factor distribution. The diffraction order characteristics of a moth-eye subwavelength structure are first analyzed using a rigorous coupled wave analysis. The moth-eye structural parameters are optimized within the spectral range of 2–5 μm using the finite-difference time-domain method. The experimental fabrication of the moth-eye structure with a waist array upon a silicon substrate is demonstrated by using three-beam laser interferometric lithography and an inductively coupled plasma process. The experimental and simulation results show good agreement. The experimental results show that the reflectivity of the moth-eye structure with a waist is less than 1.3% when the incidence angle is less than 30°, and less than 4% when the incidence angle is less than 60°. This research can guide the development of AR broadband optical components and wide-angle applications.