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CFD Analysis of Flow Structure between Rotating Disks for Semiconductor Photoresist Stripping Using High Concentrated Ozone Water

机译：高浓臭氧水旋转盘之间的流动结构的CFD分析

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Masato KOBAYASHI; Yutaka ABE;
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年度 2013
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1. Micro-PIV measurement and CFD analysis of a thin liquid flow between rotating and stationary disks [J] . Ho-Joon Lee, Koichi Nishino Journal of visualization . 2011,第3期

机译：旋转盘和固定盘之间的稀液流动的Micro-PIV测量和CFD分析
2. Analysis of Processes of Mass and Heat Transport During Gas Phase Epitaxy of a Semiconductor Structures with Rotating Disk Substrate Holder in a Horizontal Reactor [J] . E. L. Pankratov, E. A. Bulaeva Advanced Science, Engineering and Medicine . 2017,第4期

机译：水平反应器中旋转盘基板支架的半导体结构气相外延的质量和热传输过程分析
3. Heat and flow evaluation in rotating circular disks passage with a CFD approach [J] . Ng EYK., Soong CY., Liu ZY. Numerical Heat Transfer, Part A. Application: An International Journal of Computation and Methodology . 2000,第6期

机译：使用CFD方法评估旋转圆盘通道中的热量和流量
4. Soft Ashing of Photoresist for Semiconductor Process By Highly Concentrated Ozone [C] . Terumi Matsuoka, Masaharu Kashiwase, Yasuo Oguchi, Ozone world congress . 1991

机译：高浓度臭氧对半导体工艺中光刻胶的软灰化
5. Three-Dimensional Analysis of Multi-Phase Flow between Rotating Disks with Grooved Friction Surfaces [D] . Wang, Pengchuan. 2018

机译：带凹槽摩擦面的转盘之间多相流的三维分析
6. Fabrication of Smooth Patterned Structures of RefractoryMetals Semiconductors and Oxides via Template Stripping [O] . Jong Hyuk Park, Prashant Nagpal, ⊥, -1

机译：耐火材料的平滑花纹结构的制作通过模板剥离的金属半导体和氧化物
7. Photoresist stripping by ozone/water processes: Effect of additives [O] . H. Vankerckhoven, F. De Smedt, M. Claes, 2015

机译：通过臭氧/水处理的光刻胶剥离：添加剂的影响
8. Comparison of chilled DI water/ozone and CO(sub 2)-based supercritical fluids as replacements for photoresist-stripping solvents [R] . Rubin, J. B. , Davenhall, L. B. , Barton, J. , 1998

机译：冷却DI水/臭氧和CO（sub 2）基超临界流体作为光刻胶剥离溶剂替代品的比较

CFD Analysis of Flow Structure between Rotating Disks for Semiconductor Photoresist Stripping Using High Concentrated Ozone Water

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