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Use of the Thermal Chemical Vapor Deposition to Fabricate Light-Emitting Diodes Based on ZnO Nanowire/p-GaN Heterojunction

机译:热化学气相沉积的使用基于ZnO纳米线/ P-GaN异质结制造发光二极管

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摘要

The fabrication and characteristics of grown ZnO nanowire/p-GaN heterojunction light-emitting diodes are reported. Vertically aligned ZnO nanowire arrays were grown on a p-GaN substrate by thermal chemical vapor deposition in quartz tube. The rectifying current-voltage characteristics indicate that a p-n junction was formed with a heterostructure of n-ZnO nanowire/p-GaN. The room temperature electroluminescent emission peak at 425 nm was attributed to the band offset at the interface between the n-ZnO nanowire and p-GaN and to defect-related emission from GaN; it was also found that the there exist the yellow band in the hetrojunction. It would be attributed to the deep defect level in the heterojunction.
机译:报道了生长的ZnO纳米线/ p-GaN杂函数发光二极管的制造和特征。通过石英管中的热化学气相沉积在P-GaN底物上生长垂直对齐的ZnO纳米线阵列。整流电流 - 电压特性表明P-N结用N-ZnO纳米线/ p-GaN的异质结构形成。室温电致发光峰值在425nm处归因于N-ZnO纳米线和P-GaN之间的界面处的带偏移,并从GaN中缺陷相关的排放;还发现,Hetrojunction中存在黄色带。它将归因于异质结中的深度缺陷级别。

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