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Surface Reactions and Growth Kinetics of Plasma-deposited Amorphous and Microcrystalline Silicon Thin Films

机译：等离子体沉积无定形和微晶硅薄膜的表面反应和生长动力学

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Toshihiko TOYAMA;
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1. Surface smoothness of plasma-deposited amorphous silicon thin films: Surface diffusion of radical precursors and mechanism of Si incorporation [J] . Mayur S. Valipa, Tamas Bakos, Dimitrios Maroudas Physical review. B, Condensed Matter And Materials Physics . 2006,第20期

机译：等离子体沉积非晶硅薄膜的表面光滑度：自由基前体的表面扩散和Si的掺入机理
2. Mechanisms and energetics of hydride dissociation reactions on surfaces of plasma-deposited silicon thin films [J] . Tejinder Singh, Mayur S. Valipa, T. J. Mountziaris The Journal of Chemical Physics . 2007,第19期

机译：等离子体沉积硅薄膜表面氢化物离解反应的机理和能量
3. REAL-TIME SPECTROSCOPIC ELLIPSOMETRY STUDY OF THE GROWTH OF AMORPHOUS AND MICROCRYSTALLINE SILICON THIN FILMS PREPARED BY ALTERNATING SILICON DEPOSITION AND HYDROGEN PLASMA TREATMENT [J] . Layadi N., Drevillon B., Solomon I., Physical Review, B. Condensed Matter . 1995,第7期

机译：交替沉积硅和氢等离子体处理制备的非晶态和微晶态硅薄膜的生长的实时光谱分析
4. EXPERIMENTAL AND THEORETICAL INVESTIGATION OF PECVD OF MICROCRYSTALLINE SILICONTHIN FILMS PREPARED CLOSE TO THE AMORPHOUS SILICON GROWTH [C] . E. Amanatides, D. Mataras, B. Lyka, European photovoltaic solar energy conference . 2005

机译：在接近非晶硅生长的条件下制备微晶硅薄膜的PECVD的实验和理论研究
5. Adsorption and decomposition of cyanogen halides on silicon(100) surface. Characterization and chemical reaction kinetics of microcrystalline tungsten bronze thin films [D] . Kadossov, Evgueni Borisovich 2004

机译：硅（100）表面上卤化氰的吸附和分解。微晶钨青铜薄膜的表征和化学反应动力学
6. Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100 °C Using Sequential Surface Reactions [O] . Jaclyn K. Sprenger, Andrew S. Cavanagh, Huaxing Sun, -1

机译：使用顺序表面反应在室温和100°C下电子增强结晶氮化镓薄膜的生长
7. Effect of substrate temperature on deposition rate of rf plasma-deposited hydrogenated amorphous silicon thin films [O] . Andújar Bella José Luis, Bertran Serra Enric, Canillas i Biosca Adolf, 2012

机译：衬底温度对射频等离子体沉积氢化非晶硅薄膜沉积速率的影响

Surface Reactions and Growth Kinetics of Plasma-deposited Amorphous and Microcrystalline Silicon Thin Films

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