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Accurate Ab Initio Quantum Mechanics Simulations of Bi_2Se_3 and Bi_2Te_3 Topological Insulator Surfaces

机译:Bi_2Se_3和Bi_2Te_3拓扑绝缘子表面的精确的从头算量子力学模拟

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摘要

It has been established experimentally that Bi_2Te_3 and Bi_2Se_3 are topological insulators, with zero band gap surface states exhibiting linear dispersion at the Fermi energy. Standard density functional theory (DFT) methods such as PBE lead to large errors in the band gaps for such strongly correlated systems, while more accurate GW methods are too expensive computationally to apply to the thin films studied experimentally. We show here that the hybrid B3PW91 density functional yields GW-quality results for these systems at a computational cost comparable to PBE. The efficiency of our approach stems from the use of Gaussian basis functions instead of plane waves or augmented plane waves. This remarkable success without empirical corrections of any kind opens the door to computational studies of real chemistry involving the topological surface state, and our approach is expected to be applicable to other semiconductors with strong spin-orbit coupling.
机译:实验确定Bi_2Te_3和Bi_2Se_3是拓扑绝缘体,带隙为零的表面态在费米能量处表现出线性色散。标准密度泛函理论(DFT)方法(例如PBE)会导致此类强相关系统的带隙出现较大误差,而更精确的GW方法在计算上过于昂贵,无法应用于实验研究的薄膜。我们在这里显示,混合的B3PW91密度泛函以与PBE相当的计算成本为这些系统产生GW质量的结果。我们方法的效率源于使用高斯基函数而不是平面波或增强平面波。在没有任何形式的经验校正的情况下,这一非凡的成功为涉及拓扑表面状态的真实化学的计算研究打开了大门,并且我们的方法有望应用于具有强自旋轨道耦合的其他半导体。

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