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Electronic Structures of S/C-Doped TiO2Anatase (101) Surface: First-Principles Calculations

机译:S / C掺杂的TiO2AnAtase(101)表面的电子结构:第一原理计算

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摘要

The electronic structures of sulfur (S) or carbon (C)-doped TiO2 anatase (101) surfaces have been investigated by density functional theory (DFT) plane-wave pseudopotential method. The general gradient approximation (GGA) + U (Hubbard coefficient) method has been adopted to describe the exchange-correlation effects. All the possible doping situations, including S/C dopants at lattice oxygen (O) sites (anion doping), S/C dopants at titanium (Ti) sites (cation doping), and the coexisting of anion and cation doping, were studied. By comparing the formation energies, it was found that the complex of anion and cation doping configuration forms easily in the most range of O chemical potential for both S and C doping. The calculated density of states for various S/C doping systems shows that the synergistic effects of S impurities at lattice O and Ti sites lead a sharp band gap narrowing of 1.35 eV for S-doped system comparing with the pure TiO2 system.
机译:通过密度泛函理论(DFT)平面波伪能量方法研究了硫(S)或碳(C)的电子结构 - 掺杂的TiO2锐钛矿(101)表面。已经采用了一般梯度近似(GGA)+ U(Hubbard系数)方法来描述交换相关效果。研究了所有可能的掺杂情况,包括晶格氧(O)位点(O)位点(AION掺杂),钛(Ti)位点(阳离子掺杂)的S / C掺杂剂,以及阴离子和阳离子掺杂的共存。通过比较形成能量,发现阴离子和阳离子掺杂配置的复合物在S和C掺杂的最大的o化学潜力中容易。各种S / C掺杂系统的态的计算密度表明,与纯TiO2系统相比,晶格O和Ti位点在晶格O和Ti位点处的S杂质的协同效应引起了1.35eV的锐度隙窄。

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