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First principles-based multiparadigm, multiscale strategy for simulating complex materials processes with applications to amorphous SiC films

机译:第一种基于原理的多范式,多尺度策略,用于模拟复杂材料的工艺及其在非晶SiC膜中的应用

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摘要

Progress has recently been made in developing reactive force fields to describe chemical reactions in systems too large for quantum mechanical (QM) methods. In particular, ReaxFF, a force field with parameters that are obtained solely from fitting QM reaction data, has been used to predict structures and properties of many materials. Important applications require, however, determination of the final structures produced by such complex processes as chemical vapor deposition, atomic layer deposition, and formation of ceramic films by pyrolysis of polymers. This requires the force field to properly describe the formation of other products of the process, in addition to yielding the final structure of the material. We describe a strategy for accomplishing this and present an example of its use for forming amorphous SiC films that have a wide variety of applications. Extensive reactive molecular dynamics (MD) simulations have been carried out to simulate the pyrolysis of hydridopolycarbosilane. The reaction products all agree with the experimental data. After removing the reaction products, the system is cooled down to room temperature at which it produces amorphous SiC film, for which the computed radial distribution function, x-ray diffraction pattern, and the equation of state describing the three main SiC polytypes agree with the data and with the QM calculations. Extensive MD simulations have also been carried out to compute other structural properties, as well the effective diffusivities of light gases in the amorphous SiC film.
机译:最近在开发反作用力场以描述系统中对于量子力学(QM)方法太大的化学反应方面取得了进展。尤其是ReaxFF,一种具有仅通过拟合QM反应数据获得的参数的力场,已用于预测许多材料的结构和性能。然而,重要的应用需要确定通过诸如化学气相沉积,原子层沉积以及通过聚合物的热解形成陶瓷膜之类的复杂过程所产生的最终结构。除了产生材料的最终结构之外,这还需要力场来恰当地描述过程中其他产品的形成。我们描述了实现此目的的策略,并提供了其在形成具有广泛应用的非晶SiC膜中使用的示例。已经进行了广泛的反应性分子动力学(MD)模拟以模拟氢化聚碳硅烷的热解。反应产物均与实验数据吻合。除去反应产物后,将系统冷却至室温,在该温度下生成非晶SiC膜,为此,计算出的径向分布函数,x射线衍射图和描述三种主要SiC多型的状态方程与数据和质量管理计算。还进行了广泛的MD模拟,以计算其他结构特性,以及非晶SiC膜中轻气体的有效扩散率。

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