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First principles phase diagram calculations for the wurtzite-structure quasibinary systems SiC-AlN, SiC-GaN and SiC-InN

机译:纤锌矿结构准二元体系SiC-AlN,SiC-GaN和SiC-InN的第一原理相图计算

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摘要

The cluster-expansion method was used to perform first principles phase diagram calculations for the wurtzite-structure quasibinary systems (SiC)_(1-X)(AlN)_X, (SiC)_(1-X) (GaN)_X and (SiC)_(1-X)(InN)_X; and to model variations of band gaps as functions of bulk compositions and temperature. In SiC-AlN, plane wave pseudopotential formation-energy calculations predict low-energy metastable states with formation energies, ΔE_f ≾ 0.004 eV/mole (mol = one cation + one anion). The crystal structures of these states are all of the form (SiC)_m(AlN)_n(SiC)_o(AlN)_p…(m,n,o,p integers), where (SiC)_m indicates m SiC-diatomic-layers ⊥ to the hexagonal c-axis (c_(Hex)) and similarly for (AlN)_n, (SiC)_o and (AlN)_p. The presence of low-energy layer-structure metastable states helps to explain why one can synthesize (SiC)_(1-X)(AlN)_X films, or single crystals with any value of X, in spite of the apparently strong tendency toward immiscibility. In SiC-GaN, ordered structures are predicted at X = 1/4, 1/2, and 3/ 4 (Pm, Pmn2_1 and Pm, respectively). In SiC-InN, one Cmc2_1 ordered phase is predicted at X = 1/2.
机译:使用簇扩展方法对纤锌矿结构准二元体系(SiC)_(1-X)(AlN)_X,(SiC)_(1-X)(GaN)_X和( SiC)_(1-X)(InN)_X;并模拟带隙随本体组成和温度变化的变化。在SiC-AlN中,平面波假电位的形成能计算可预测低能的亚稳态,其形成能为ΔE_f(0.004 eV / mol(mol =一个阳离子+一个阴离子)。这些状态的晶体结构均为(SiC)_m(AlN)_n(SiC)_o(AlN)_p…(m,n,o,p整数)形式,其中(SiC)_m表示m碳化硅-层⊥到六边形c轴(c_(Hex)),并且对于(AlN)_n,(SiC)_o和(AlN)_p同样。低能层结构亚稳态的存在有助于解释为什么尽管有明显的趋势,人们仍可以合成(SiC)_(1-X)(AlN)_X薄膜或具有任何X值的单晶。不混溶。在SiC-GaN中,预测有序结构为X = 1 / 4、1 / 2和3/4(分别为Pm,Pmn2_1和Pm)。在SiC-InN中,一个Cmc2_1有序相被预测为X = 1/2。

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