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Direct detection and imaging of low-energy electrons with delta-doped charge-coupled devices

机译:使用掺ta电荷耦合器件直接检测和成像低能电子

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摘要

We report the use of delta-doped charge-coupled devices (CCDs) for direct detection of electrons in the 50–1500 eV energy range. We show that modification of the CCD back surface by molecular beam epitaxy can greatly improve sensitivity to low-energy electrons by introducing an atomically abrupt dopant profile to eliminate the dead layer. Using delta-doped CCDs, we have extended the energy threshold for detection of electrons by over an order of magnitude. We have also measured high gain in response to low-energy electrons using delta-doped CCDs. The effect of multiple electron hole pair production on the observed signals is discussed. Electrons have been directly imaged with a delta-doped CCD in the 250–750 eV range.
机译:我们报告了使用增量掺杂电荷耦合器件(CCD)直接检测50–1500 eV能量范围内的电子。我们表明通过分子束外延修饰CCD背面可以通过引入原子突变掺杂物轮廓消除死层来大大提高对低能电子的灵敏度。使用增量掺杂的CCD,我们将用于检测电子的能量阈值扩展了一个数量级。我们还使用掺ta CCD测量了响应低能电子的高增益。讨论了产生多个电子空穴对对观察到的信号的影响。电子已经直接用250–750 eV范围内的δ掺杂CCD成像。

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