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Discharge Produced Plasma Light Sources. Technical Issues Regarding the Practical Application and Future Prospects of a Discharge Produced Plasma Sources for Lithography.

机译：放电产生的等离子体光源。关于放电的实际应用和未来前景的技术问题，用于光刻产生的等离子体源。

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Hiroto SATO;
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年度 2003
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1. Laser-produced plasma versus laser-assisted discharge plasma: physics and technology of extreme ultraviolet lithography light sources [J] . Guido Schriever, Olivier Semprez, Jeroen Jonkers, Journal of Micro/Nanolithography, MEMS, and MOEMS . 2012,第2期

机译：激光产生的等离子体与激光辅助的放电等离子体：极紫外光刻光源的物理和技术
2. Characterization of collector optic material samples before and after exposure in laser produced plasma and discharge produced plasma extreme ultraviolet sources [J] . Huatan Qiu, Darren A. Alman, Keith C. Thompson, Journal of Microlithography, Microfabrication, and Microsystems. (JM3) . 2006,第3期

机译：暴露在激光产生的等离子体中和放电产生的等离子体极端紫外线源之前和之后的收集器光学材料样品的特性
3. Investigation on recovery of gap insulation strength and EUV radiation in the post-discharge stage of a laser-triggered discharge produced tin plasma EUV source [J] . P Lu, S Kitajima, S Lim, Journal of Physics, D. Applied Physics: A Europhysics Journal . 2014,第43期

机译：激光触发放电产生的锡等离子体EUV源放电后的间隙绝缘强度和EUV辐射恢复的研究
4. Modelling of high intensity EUV light sources based on laser - discharge-produced plasmas - (PPT) [C] . Sergey V. Zakharov, Peter Choi, Vasily S. Zakharov, International Symposium on Extreme Ultraviolet Lithography . 2010

机译：基于激光排出产生的等离子体的高强度EUV光源建模 - （PPT）
5. Studies of extreme ultraviolet emission from laser produced plasmas, as sources for next generation lithography. [D] . Cummins, Thomas. 2014

机译：研究激光产生的等离子体产生的极紫外线，作为下一代光刻的来源。
6. Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources [O] . Kentaro Tomita, Yuta Sato, Syouichi Tsukiyama, -1

机译：极紫外光刻光源的激光产生的锡等离子体的电子密度和温度的时间分辨二维分布
7. Generation of Atmospheric-Pressure Glow Discharge and Its Applications 4.Technical Issues and Future Prospects of Non-Thermal Atmospheric-Pressure Plasma [O] . Ryohei ITATANI 2003

机译：一代大气压辉光放电及其应用4.非热大气压等离子体的技术问题和未来前景

Discharge Produced Plasma Light Sources. Technical Issues Regarding the Practical Application and Future Prospects of a Discharge Produced Plasma Sources for Lithography.

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