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Characteristics of Ga doped ZnO Thin Films Deposited by RF Magnetron Sputtering with Base Pressure

机译：基于基础压力的RF磁控溅射沉积的Ga掺杂ZnO薄膜的特性

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Deok Kyu Kim;
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1. Effects of sputtering pressure on properties of Al doped ZnO thin films dynamically deposited by rf magnetron sputtering [J] . Zhou H B1, Zhang H Y1, Tan M L2, Materials Research Innovations . 2012,第6期

机译：溅射压力对射频磁控溅射动态沉积铝掺杂ZnO薄膜性能的影响
2. Influence of Growth Temperature on the Characteristics of Ga-Doped ZnO Thin Films Deposited by Magnetron Sputtering [J] . Young Yi Kim, Bo Hyun Kong, Hyung Koun Cho Japanese journal of applied physics . 2009,第8issuea2期

机译：生长温度对磁控溅射沉积Ga掺杂ZnO薄膜特性的影响
3. Investigation of physico-chemical properties of conductive Ga- doped ZnO thin films deposited on glass and silicon wafers by RF magnetron sputtering [J] . B. Khalfallah, F. Chaabouni, G. Schmerber, Journal of materials science . 2017,第1期

机译：射频磁控溅射沉积在玻璃和硅片上的导电Ga掺杂ZnO薄膜的理化性质研究
4. Dependence of Argon Gas Pressure on the Structure and Photoelectric of Ga-Doped ZnO Thin Films Deposited by DC Magnetron Sputtering [C] . J. S. Zhang, H. D. Yang, B. Huang, Symposium on Photonics and Optoelectronics . 2012

机译：氩气压对DC磁控溅射沉积的Ga掺杂ZnO薄膜结构和光电的依赖性
5. Manufacturing gallium doped ZNO thin films suitable for use in thin film transistors using unbalanced magnetron sputtering. [D] . Jones, Timothy R. 2013

机译：使用不平衡磁控溅射制造适用于薄膜晶体管的掺镓ZNO薄膜。
6. Resistive Switching Characteristics of Li-Doped ZnO Thin Films Based on Magnetron Sputtering [O] . Xiaofeng Zhao, Yi Li, Chunpeng Ai, 2019

机译：磁控溅射锂掺杂ZnO薄膜的电阻开关特性
7. Investigation of the Properties of Al-doped ZnO Thin Films with Sputtering Pressure Deposition by RF Magnetron Sputtering [O] . Weiqiang Shuai, Yuehui Hu, Yichuan Chen, 2017

机译：RF磁控溅射溅射压力沉积抗氮锌薄膜性能研究

Characteristics of Ga doped ZnO Thin Films Deposited by RF Magnetron Sputtering with Base Pressure

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