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Analysis on Radical Photo- and Thermal-Polymerization of Negative-Tone Acrylic Resist for High Resolution

机译：高分辨率负性丙烯酸抗蚀剂的自由基光和热聚合分析

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Emiko Oota; Shota Okade; Yukiko Muramatsu; Ken Sawabe; Yasuharu Murakami;
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年度 2015
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1. Analysis on Radical Photo- and Thermal-Polymerization of Negative-Tone Acrylic Resist for High Resolution [J] . Oota Emiko, Okade Shota, Muramatsu Yukiko, Journal of Photopolymer Science and Technology . 2015,第1期

机译：高分辨率负性丙烯酸树脂的自由基光聚合和热聚合
2. Analysis on Radical Photo- and Thermal-Polymerization of Negative-Tone Acrylic Resist for High Resolution [J] . Emiko Oota, Shota Okade, Yukiko Muramatsu, Journal of Photopolymer Science and Technology . 2015,第1期

机译：高分辨率负性丙烯酸树脂的自由基光聚合和热聚合
3. Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography [J] . Ivan Junarsa, Mark P. Stoykovich, Paul F. Nealey, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2005,第1期

机译：氢倍半硅氧烷作为用于极端紫外光刻的高分辨率负型抗蚀剂
4. Towards 11 nm half-pitch Resolution for a Negative-tone Chemically Amplified Molecular Resist Platform for EUV Lithography [C] . Andreas Frommhold, Alexandra McClelland, Dongxu Yang, Advances in Patterning Materials and Processes XXXII . 2015

机译：用于EUV光刻的负性化学放大分子抗蚀剂平台的半间距分辨率接近11 nm
5. Photo- and radiochromic transformations in aluminum oxide:carbon,magnesium fluorescent nuclear track detectors and high resolution imaging of radiation fields. [D] . Sykora, Garrett Jeffrey. 2010

机译：氧化铝中的光变色和放射性变色：碳，镁荧光核径迹探测器和辐射场的高分辨率成像。
6. Accuracy and Resolution Analysis of a Direct Resistive Sensor Array to FPGA Interface [O] . Óscar Oballe-Peinado, Fernando Vidal-Verdú, José A. Sánchez-Durán, 2016

机译：直接电阻传感器阵列至FPGA接口的精度和分辨率分析
7. Towards 11 nm half-pitch Resolution for a Negative-tone Chemically Amplified Molecular Resist Platform for EUV Lithography [O] . Frommhold, A, McClelland, A, Yang, D, 2015

机译：用于EUV光刻的负色度化学放大分子抗蚀剂平台的11nm半间距分辨率

Analysis on Radical Photo- and Thermal-Polymerization of Negative-Tone Acrylic Resist for High Resolution

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