We describe the preparation of a tungsten pillar nanoimprint stamp withoutudthe use of lithography and etching techniques. Structures with heights ofud15 nm were prepared on the basis of self-ordered porous alumina templatesudand this was followed by DC sputtering of tungsten. The stamp wasudsuccessfully used to prepare an aluminium surface to obtain highly orderedudporous anodic alumina films after a single anodization step. The preparationudefficiency for highly ordered porous alumina was dramatically improved asudcompared to the more conventional two-step anodization–strip-anodizationudmethod, as a sacrificial layer with a thickness of a few hundred micrometresudwas not required. In addition, by fractal calculations, we have evaluated theuddegree of ordering of the asperities on the nanoimprint master stamp.
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