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Influence of Temperature on Void Collapse in Single Crystal Nickel under Hydrostatic Compression

机译:温度对静压压缩下单晶镍中空隙塌陷的影响

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摘要

Employing atomistic simulations, we investigated the void collapse mechanisms in single crystal Ni during hydrostatic compression and explored how the atomistic mechanisms of void collapse are influenced by temperature. Our results suggest that the emission and associated mutual interactions of dislocation loops around the void is the primary mechanism of void collapse, irrespective of the temperature. The rate of void collapse is almost insensitive to the temperature, and the process is not thermally activated until a high temperature (∼1200–1500 K) is reached. Our simulations reveal that, at elevated temperatures, dislocation motion is assisted by vacancy diffusion and consequently the void is observed to collapse continuously without showing appreciable strain hardening around it. In contrast, at low and ambient temperatures (1 and 300 K), void collapse is delayed after an initial stage of closure due to significant strain hardening around the void. Furthermore, we observe that the dislocation network produced during void collapse remains the sample even after complete void collapse, as was observed in a recent experiment of nickel-base superalloy after hot isostatic pressing.
机译:采用原子模拟,我们在静水压缩过程中调查了单晶Ni中的空隙塌陷机制,并探讨了空隙塌陷的原子机制如何受到温度的影响。我们的研究结果表明,无论温度如何,空隙周围的错位环的发射和相关相互相互作用是空隙塌陷的主要机制。空隙塌陷率几乎对温度不敏感,并且在达到高温(〜1200-1500k)之前,该方法不会热激活。我们的模拟显示,在高温下,空位扩散的辅助脱位运动,因此观察到空隙连续塌陷,而不显示其周围的明显应变硬化。相反,在低和环境温度(1和300k)下,由于在空隙周围的显着的应变硬化,在闭合阶段之后延迟空隙塌陷。此外,我们观察到在空隙塌陷期间在空隙塌陷期间产生的位错网络仍然是样品,如在热等静压后最近的镍基超合金的最新实验中所观察到的。

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