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Sputter Power Influenced Structural, Electrical, and Optical Behaviour of Nanocrystalline CuNiO2 Films Formed by RF Magnetron Sputtering

机译：溅射功率影响了RF磁控溅射形成的纳米晶型CUNIO2薄膜的结构，电气和光学行为

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A. Sreedhar; M. Hari Prasad Reddy; S. Uthanna; J. F. Pierson;
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1. Sputter power and sputter pressure influenced structural and optical behaviour of RF sputtered nanocrystalline ZnO films [J] . R. Subba Reddy, A. Sivasankar Reddy, B. Radhakrishna, Crystal Research and Technology: Journal of Experimental and Industrial Crystallography . 2012,第10期

机译：溅射功率和溅射压力影响RF溅射纳米ZnO薄膜的结构和光学性能
2. Influence of sputtering power on structural, optical and electrical properties of CdTe thin films prepared by DC magnetron sputtering [J] . Peng Gu, Xinghua Zhu, Jitao Li, Journal of materials science . 2018,第17期

机译：溅射功率对直流磁控溅射CdTe薄膜结构，光学和电学性能的影响
3. Influence of sputtering power on structural, electrical and optical properties of reactive magnetron sputtered Cr doped CdO thin films [J] . B. Hymavathi, B. Rajesh Kumar, T. Subba Rao Journal of materials science . 2017,第10期

机译：溅射功率对反应磁控溅射Cr掺杂CdO薄膜结构，电学和光学性能的影响
4. Structural, Electrical and Optical Behaviour of RF Magnetron Sputtered Nanocrystalline Silver Oxide Films: Bias Effect [C] . P. Narayana Reddy, M. Hari Prasad Reddy, S. Uthanna, International Conference on Light . 2011

机译：RF磁控溅射纳米晶银氧化膜的结构，电气和光学行为：偏置效果
5. Study of structural, electrical, optical and magnetic properties of zinc oxide based films produced by magnetron sputtering. [D] . Angelats Silva, Luis Manuel. 2007

机译：研究磁控溅射生产的氧化锌基薄膜的结构，电，光和磁性能。
6. Regulation of Substrate-Target Distance on the Microstructural Optical and Electrical Properties of CdTe Films by Magnetron Sputtering [O] . Peng Gu, Xinghua Zhu, Haihua Wu, 2018

机译：磁控溅射对CdTe薄膜微结构光学和电学性质的基靶距离调节
7. Influence of Sputtering Power on Structural and Optical Properties of ZnO Films Fabricated by RF Magnetron Sputtering [O] . Zhou Yang, Zheng Hong-fang, Zhao Guang, 2016

机译：溅射功率对射频磁控溅射制备ZnO薄膜结构和光学性质的影响

Sputter Power Influenced Structural, Electrical, and Optical Behaviour of Nanocrystalline CuNiO2 Films Formed by RF Magnetron Sputtering

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