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Analysis of the Effect of Gas Convection on Temperature Distribution in a Wafer during Rapid Thermal Processing with Lamp Heaters.

机译：灯加热器快速热加工过程中气体对流对晶片温度分布的影响分析。

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Shigeki HIRASAWA; Tadashi SUZUKI; Shigenao MARUYAMA; Yuhei TAKEUCHI;
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年度 2001
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2. Wafer Temperature Measurement in a Rapid Thermal Processor with Modulated Lamp Power [J] . B. NGUYENPHU, A.T. FIORY Journal of Electronic Materials . 1999,第12期

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3. Optimization of rapid thermal processing for uniform temperature distribution on wafer surface [J] . Hyuck-Keun Oh, Sae Byul Kang, Young Ki Choi, Journal of Mechanical Science and Technology . 2009,第6期

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4. ANALYSIS OF THE EFFECT OF HEATING CONTROL CONDITIONS ON TEMPERATURE DISTRIBUTION IN A WAFER DURING RAPID THERMAL PROCESSING WITH LAMP HEATERS [C] . Shigeki Hirasawa, Shigenao Maruyama, Tadashi Suzuki, The 2001 ASME International Mechanical Engineering Congress and Exposition, 2001, Nov 11-16, 2001, New York, New York . 2001

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5. Measurement and control of silicon wafer temperature and oxide film thickness in rapid thermal processing using in situ ellipsometry. [D] . Sampson, Ronald Kevin. 1992

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Analysis of the Effect of Gas Convection on Temperature Distribution in a Wafer during Rapid Thermal Processing with Lamp Heaters.

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