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AC-coupled n-in-p pixel detectors on MCz silicon with atomic layer deposition (ALD) grown thin film

机译：MCZ硅的AC耦合的N-P像素探测器，原子层沉积（ALD）生长薄膜

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A. Gädda; J. Ott; S. Bharthuar; E. Brücken; M. Kalliokoski; A. Karadzhinova-Ferrer; M. Bezak; S. Kirschenmann; V. Litichevsky; M. Golovleva; L. Martikainen; A. Winkler; V. Chmill; E. Tuovinen; P. Luukka; J. Härkönen;
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1. AC-coupled n-in-p pixel detectors on MCz silicon with atomic layer deposition (ALD) grown thin film [J] . A. Gaedda, J. Ott, S. Bharthuar, Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms . 2021,第Jana11期

机译：MCZ硅的AC耦合的N-P像素探测器，原子层沉积（ALD）生长薄膜
2. Processing of AC-coupled n-in-p pixel detectors on MCz silicon using atomic layer deposited aluminium oxide [J] . J. Ott, A. Gaedda, S. Bharthuar, Nuclear Instruments & Methods in Physics Research . 2020,第Apra1期

机译：使用原子层沉积氧化铝在MCz硅上处理AC耦合n-in-p像素检测器
3. Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors [J] . J. Haerkoenen, J. Ott, M. Maekelae, Nuclear Instruments & Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment . 2016,第sepa21期

机译：用于超细间距像素检测器的原子层沉积（ALD）生长薄膜
4. Atomic layer deposition (ALD) of TiO_2 and Al_2O_3 thin films on silicon [C] . Conference on device and process technologies for MEMS, microelectronics, and photonics . 2004

机译：TiO_2的原子层沉积（ALD）和硅的AL_2O_3薄膜
5. Molecular engineering for thin-film applications: Area-selective atomic layer deposition (ALD) and molecular-atomic layer deposition (MALD). [D] . Huang, Jie. 2014

机译：薄膜应用的分子工程：区域选择性原子层沉积（ALD）和分子原子层沉积（MALD）。
6. Effect of Composition Interface and Deposition Sequence on Electrical Properties of Nanolayered Ta2O5-Al2O3 Films Grown on Silicon by Atomic Layer Deposition [O] . Junpeng Li, Jianzhuo Wu, Junqing Liu, 2019

机译：组成界面和沉积顺序对原子层沉积在硅上生长的纳米Ta2O5-Al2O3薄膜电学性能的影响
7. Effect of Composition, Interface, and Deposition Sequence on Electrical Properties of Nanolayered Ta2O5-Al2O3 Films Grown on Silicon by Atomic Layer Deposition [O] . Junpeng Li, Jianzhuo Wu, Junqing Liu, 2019

机译：用原子层沉积在硅上生长的纳米制剂Ta2O5-Al2O3薄膜电性能的作用，界面和沉积序列
8. Spoof-Like Plasmonic Behavior of Plasma Enhanced Atomic Layer Deposition Grown Ag Thin Films. [R] . Prokes, S. M., Glembocki, O. J., Cleveland, E., 2012

机译：等离子体增强原子层沉积ag薄膜的类似等离子体行为。

AC-coupled n-in-p pixel detectors on MCz silicon with atomic layer deposition (ALD) grown thin film

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