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A Fast Mask Manufacturability and Process Variation Aware OPC Algorithm with Exploiting a Novel Intensity Estimation Model

机译：利用新型强度估计模型的快速掩模可制造性和过程变化识别OPC算法

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Ahmed AWAD; Atsushi TAKAHASHI; Chikaaki KODAMA;
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年度 2016
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1. A Fast Process-Variation-Aware Mask Optimization Algorithm With a Novel Intensity Modeling [J] . Ahmed Awad, Atsushi Takahashi, Satoshi Tanaka, IEEE transactions on very large scale integration (VLSI) systems . 2017,第3期

机译：具有新强度建模的快速过程变化感知掩模优化算法
2. Incorporating Manufacturing Process Variation Awareness in Fast Design Optimization of Nanoscale CMOS VCOs [J] . Mohanty S.P., Kougianos E. IEEE Transactions on Semiconductor Manufacturing . 2014,第1期

机译：将制造工艺变化意识纳入纳米级CMOS VCO的快速设计优化中
3. A Fast and Accurate Process Variation-Aware Modeling Technique for Resistive Bridge Defects [J] . Zhong S., Khursheed S., Al-Hashimi B. M. Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on . 2011,第11期

机译：一种快速准确的电阻桥缺陷过程变化感知建模技术
4. A fast manufacturability aware Optical Proximity Correction (OPC) algorithm with adaptive wafer image estimation [C] . Ahmed Awad, Atsushi Takahashi, Chikaaki Kodama Design, Automation Test in Europe Conference Exhibition . 2016

机译：具有自适应晶圆图像估计的快速可制造性感知光学邻近校正（OPC）算法
5. Diffeomorphic Variational Models and Their Fast Algorithms for Image Registration Problems [D] . Zhang, Daoping. 2019

机译：微晶变分模型及其用于图像登记问题的快速算法
6. Fast-SNP: a fast matrix pre-processing algorithm for efficient loopless flux optimization of metabolic models [O] . Pedro A. Saa, Lars K. Nielsen -1

机译：Fast-SNP：一种快速的矩阵预处理算法可有效地进行代谢模型的无环通量优化
7. Process variation aware OPC with variational lithography modeling [O] . Peng Yu, Sean X. Shi, David Z. Pan 2006

机译：具有变分光刻建模的工艺变化感知OpC
8. Applications of Signal Processing, Fast Algorithms and Multivariable Control toSemiconductor Manufacturing [R] . Kailath, T. 1995

机译：信号处理，快速算法和多变量控制在半导体制造中的应用

A Fast Mask Manufacturability and Process Variation Aware OPC Algorithm with Exploiting a Novel Intensity Estimation Model

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