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Preparation of Replicated Resin Mold for UV Nanoimprint Using Reworkable Dimethacrylate

机译：使用可再加工二甲基丙烯酸酯的UV纳米压印制备uV纳米压印

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Daisuke Matsukawa; Haruyuki Okamura; Masamitsu Shirai;
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年度 2010
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1. Preparation of Replicated Resin Mold for UV Nanoimprint Using Reworkable Dimethacrylate [J] . Daisaku Matsukawa, Haruyuki Okamura, Masamitsu Shirai Journal of Photopolymer Science and Technology . 2010,第6期

机译：用可修复的二甲基丙烯酸酯制备用于紫外线纳米压印的复制树脂模具
2. Preparation of Replicated Resin Mold for UV Nanoimprint Using Reworkable Dimethacrylate [J] . Daisuke Matsukawa, Haruyuki Okamura, Masamitsu Shirai Journal of Photopolymer Science and Technology . 2010,第6期

机译：用可修复的二甲基丙烯酸酯制备用于紫外线纳米压印的复制树脂模具
3. Reworkable dimethacrylates with low shrinkage and their application to UV nanoimprint lithography [J] . Daisaku Matsukawa, Haruyuki Okamura, Masamitsu Shirai Journal of Materials Chemistry: An Interdisciplinary Journal dealing with Synthesis, Structures, Properties and Applications of Materials, Particulary Those Associated with Advanced Technology . 2011,第28期

机译：低收缩率可修复二甲基丙烯酸酯及其在紫外纳米压印光刻中的应用
4. Removal of UV cured resin mold on quartz using UV/03 cleaning for Nanoimprinting Lithography (PPT) [C] . Min-Su Kim, Bonq-Kyun Kang, Jae-Kwan Kim SEMATECH Surface Preparation and Cleaning Conference . 2012

机译：使用UV / 03清洁除去石英紫外线固化树脂模具，用于纳米压印光刻（PPT）
5. Flexible Polymer Mold and UV-Curable Materials for Nanoimprint and Advanced Nanofabrication [D] . Zhang, Qi. 2018

机译：用于纳米压印和高级纳米加工的柔性聚合物模具和紫外线固化材料
6. Analysis of Network Structures in Thiol-Ene UV Curing System Using Reworkable Resins [O] . Haruyuki Okamura, Masashi Yamagaki, Kyohei Nakata 2019

机译：可修复树脂对硫醇-紫外线固化系统网络结构的分析
7. Fabrication of Electroless NiP Nanoimprinting Mold by Replication of UV-treated and Self-assembled-monolayer-modified Cyclo-olefin Polymer Nanopatterns [O] . Cheng Ping LIN, Mikiko SAITO, Takayuki HOMMA 2013

机译：通过UV处理和自组装单层改性环烯聚合物纳米滤膜复制制造无电型纳米压印模具

Preparation of Replicated Resin Mold for UV Nanoimprint Using Reworkable Dimethacrylate

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