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On the role of secondary electron emission in capacitively coupled radio‐frequency plasma sheath: A theoretical ground

机译：二次电子发射在电容耦合射频等离子体护套中的作用：理论局面

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Guang‐Yu Sun; Han‐Wei Li; An‐Bang Sun; Yuan Li; Bai‐Peng Song; Hai‐Bao Mu; Xiao‐Ran Li; Guan‐Jun Zhang;
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1. On the role of secondary electron emission in capacitively coupled radio‐frequency plasma sheath: A theoretical ground [J] . Sun Guang-Yu, Li Han-Wei, Sun An-Bang, Plasma processes and polymers . 2019,第11期

机译：关于二次电子发射在电容耦合射频等离子体鞘中的作用：理论基础
2. The role of electron induced secondary electron emission from SiO2 surfaces in capacitively coupled radio frequency plasmas operated at low pressures [J] . B Horváth, M Daksha, I Korolov, Plasma Sources Science & Technology . 2017,第12期

机译：电子诱导的二次电子发射在电容耦合射频等离子体中的SiO2表面在低压下操作
3. Production of high-density capacitively coupled radio-frequency discharge plasma by high-secondary-electron-emission oxide [J] . Yasunori Ohtsu, Hiroharu Fujita Applied Physics Letters . 2004,第21期

机译：高次电子发射氧化物制备高密度电容耦合射频放电等离子体
4. The effect of secondary electrons on ion flux and ion mean energy in dualfrequency capacitively coupled radio frequency discharges [C] . J. Schulze, Z. Donko, E. Schungel, International Conference on Phenomena in Ionized Gases . 2011

机译：二次电子对二元频率耦合射频放电中的离子通量和离子平均能的影响
5. Plasma sheath behavior in a total nonambipolar radio frequency generated plasma electron source. [D] . Longmier, Benjamin Wesley. 2007

机译：等离子体鞘层在总的非双极射频产生的等离子体电子源中的行为。
6. Spatially Resolved Optoelectronic Properties of Al-Doped Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Plasma Sputtering Without Substrate Heating [O] . Eugen Stamate 2020

机译：在不加热衬底的情况下通过射频磁控等离子体溅射沉积的铝掺杂氧化锌薄膜的空间分辨光电性能
7. Investigation of Ion and Electron Kinetic Phenomena in Capacitively Coupled Radio-Frequency Plasma Sheaths: A Simulation Study [O] . Sharma Sarveshwar 2013

机译：电容耦合射频等离子体鞘内离子和电子动力学现象的模拟研究
8. Effects of Secondary Electron Emission on the Collector and Source Sheaths of a Finite Ion Temperature Plasma [R] . Schwager, L. A. 1988

机译：二次电子发射对有限离子温度等离子体集电极和源极鞘的影响

On the role of secondary electron emission in capacitively coupled radio‐frequency plasma sheath: A theoretical ground

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