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Low Temperature Preparation of Transparent Conducting Material in ZnO-In2O3 System by Homogenenous Aqueous Solution Method.

机译：均化水溶液法低温制备ZnO-In2O3体系中透明导电材料。

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Shinichi Kikkawa; Hiroshi Kanasaki; Masao Takahashi; Adhikary Kalyan; Ken Hirota; Osamu Yamaguchi;
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年度 1999
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1. Low temperature preparation of transparent conducting material in ZnO-In{sub}2O{sub}3 system by homogenenous aqueous solution method [J] . Shinichi Kikkawa, Hiroshi Kanasaki, Masao Takahashi, 粉体および粉末冶金 . 1999,第2期

机译：均相水溶液法低温制备ZnO-In {sub} 2O {sub} 3体系透明导电材料
2. Low temperature preparation of transparent conducting material in ZnO-In{sub}2O{sub}3 system by homogenenous aqueous solution method [J] . Shinichi Kikkawa, Hiroshi Kanasaki, Masao Takahashi, 粉体および粉末冶金 . 1999,第2期

机译：通过均诺水溶液法在ZnO-in {Sub} 2O {Sub} 3系统中低温制备透明导电材料
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Low Temperature Preparation of Transparent Conducting Material in ZnO-In2O3 System by Homogenenous Aqueous Solution Method.

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