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Structural and optical characterization of titanium nitride thin films deposited by magnetron sputtering

机译：磁控溅射沉积的氮化钛薄膜的结构和光学表征

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1. Structural, morphological and mechanical hardness properties of titanium nitride thin films deposited by DC magnetron sputtering: Effect of substrate temperature [J] . Hosseinnejad M. T., Ettehadi-Abari M., Panahi N., Journal of optoelectronics and advanced materials . 2017,第5a6期

机译：DC磁控溅射沉积的氮化钛薄膜的结构，形态学和机械硬度特性：基材温度的影响
2. The effect of annealing on the structural, optical and electrical properties of Titanium Nitride (TIN) thin films prepared by DC magnetron sputtering with supported discharge [J] . A. Kavitha, R. Kannan, P. Sreedhara Reddy, Journal of materials science . 2016,第10期

机译：退火对带支撑放电的直流磁控溅射制备的氮化钛（TIN）薄膜的结构，光学和电学性质的影响
3. Structural and Optical Investigations of Silicon Carbon Nitride Thin Films Deposited by Magnetron Sputtering [J] . Eric Tomasella, Laurent Spinelle, AngÉlique Bousquet, Plasma processes and polymers . 2009,第Supplementa1期

机译：磁控溅射沉积氮化硅碳薄膜的结构和光学研究
4. Characterization of Aluminium Titanium Nitride Thin Films Deposited by Reactive Magnetron Co-sputtering [C] . Adisorn Buranawong, Surasing Chaiyakhun, Pichet Limsuwan International Conference on Functionalized and Sensing Materials . 2010

机译：反应磁控凝固沉积铝钛氮化钛薄膜的特征
5. Tribological and structural properties of titanium nitride and titanium aluminum nitride coatings deposited with modulated pulsed power magnetron sputtering [D] . Ward, Logan 2014

机译：调制脉冲功率磁控溅射沉积氮化钛和氮化铝钛涂层的摩擦学和结构性能
6. Structural and optical properties of ZnS thin films deposited by RF magnetron sputtering [O] . Dong Hyun Hwang, Jung Hoon Ahn, Kwun Nam Hui, 2012

机译：射频磁控溅射沉积ZnS薄膜的结构和光学性质
7. Structural and Optical Properties of Aluminum Nitride Thin Films Deposited by Pulsed DC Magnetron Sputtering [O] . R. K. Choudhary, P. Mishra, A. Biswas, 2013

机译：脉冲DC磁控溅射沉积的氮化铝薄膜的结构和光学性质
8. Characterization of DC Magnetron Sputtering Systems for the Deposition of Tantalum Nitride, Titanium, and Palladium Thin Films for HMC (Hybrid Microcircuit) Applications. [R] . Snow, G. S. 1989

机译：用于HmC（混合微电路）应用的氮化钽，钛和钯薄膜沉积的DC磁控溅射系统的表征。

Structural and optical characterization of titanium nitride thin films deposited by magnetron sputtering

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