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Preparation of AlN Films as Insulation Gap Layers for MR Heads by Magnetron Sputtering Enhanced with an Inductively Coupled rf Plasma

机译：用电感耦合的RF等离子体增强MR头的绝缘间隙层作为MR头的绝缘间隙层的制备

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T. Morita; T. Yamamoto; T. Kurauchi; M. Matsuura;
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年度 1999
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1. Preparation of AlN films as insulation gap layers for MR heads by magnetron sputtering enhanced with an inductively coupled rf plasma [J] . T.Morita, T.Yamamoto 日本応用磁気学会誌 . 1999,第4a2期

机译：感应耦合射频等离子体增强的磁控溅射制备AlN膜作为MR磁头的绝缘间隙层
2. Preparation of AlN films as insulation gap layers for MR heads by magnetron sputtering enhanced with an inductively coupled rf plasma [J] . T.Morita, T.Yamamoto 日本応用磁気学会誌 . 1999,第4a2期

机译：用电感耦合的射频等离子体增强MR头作为MR头的绝缘间隙层的制备。
3. Microstructure, hardness and corrosion resistance of ZrN films prepared by inductively coupled plasma enhanced RF magnetron sputtering [J] . Liu F, Meng YD, Ren ZX, Plasma Science & Technology . 2008,第2期

机译：电感耦合等离子体增强射频磁控溅射制备ZrN薄膜的组织，硬度和耐蚀性
4. Preparation Of Co-Cr Films Using Inductively-Coupled-plasma Assisted Magnetron Sputtering [C] . Yamamoto, S., Hayashil, . 1998

机译：电感耦合等离子体辅助磁控溅射制备Co-Cr膜
5. Sample preparation and sample introduction for inductively coupled plasma - mass spectrometry and inductively coupled plasma - atomic emission spectroscopy. [D] . Ackley, Kathryn Lynn. 2000

机译：电感耦合等离子体质谱法和电感耦合等离子体原子发射光谱法的样品制备和样品引入。
6. The Influence of AlN Intermediate Layer on the Structural and Chemical Properties of SiC Thin Films Produced by High-Power Impulse Magnetron Sputtering [O] . Nierlly Galvão, Marciel Guerino, Tiago Campos, 2016

机译：AlN中间层对大功率脉冲磁控溅射SiC薄膜结构和化学性能的影响
7. Electrical Properties of Very Thin Al2O3 Films Prepared by Magnetron Sputtering Enhanced with an Inductively Coupled rf Plasma [O] . T. Morita, T. Yamamoto, T. Kurauchi, 1998

机译：通过磁控溅射制备的非常薄的Al2O3膜的电性能，具有电感耦合的RF等离子体

Preparation of AlN Films as Insulation Gap Layers for MR Heads by Magnetron Sputtering Enhanced with an Inductively Coupled rf Plasma

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