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Effect of substrate temperature on a-Si:H thin films fabricated by double tubed coaxial line type microwave plasma CVD.

机译：基材温度对双管同轴线型微波等离子体CVD制造的Si：H薄膜的影响。

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Isamu Kato; Tetsuya Ueda; Kazuhisa Hatanaka;
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年度 1986
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1. Effect of electrical and mechanical stresses of low temperature a-Si:H thin film transistors fabricated on polyimide and glass substrates [J] . Jung-Jie Huang, Chao-Nan Chen Thin Solid Films . 2013,第FEBa1期

机译：在聚酰亚胺和玻璃基板上制造的低温a-Si：H薄膜晶体管的电气和机械应力的影响
2. Effects of substrate temperature on physical properties of microrod-type multiferroic composite thin films fabricated by metal organic chemical vapor deposition [J] . Migita Tsubasa, Kobune Masafumi, Ito Ryoga, Japanese journal of applied physics . 2020,第SP期

机译：金属有机化学气相沉积制造的微型型型多体复合薄膜物理性质的影响
3. P-type Zno thin films fabricated by Al-N co-doping method at different substrate temperature [J] . Yuan GD, Ye ZZ, Qian Q, Journal of Crystal Growth . 2005,第3a4期

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4. High-Performance Top-Gate and Double-Gate Low-Temperature Polycrystalline-Silicon Thin-Film Transistors Fabricated using Continuous-Wave-Laser Lateral Crystallization on a Glass Substrate [C] . A. Hara, T. Meguro, S. Sasaki, International Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors . 2015

机译：在玻璃基板上使用连续波激光横向结晶制造的高性能顶栅和双栅低温多晶硅薄膜晶体管
5. Growth, characterization and electron field emission measurements from thin film cold cathode materials fabricated by a modified microwave plasma assisted chemical vapor deposition diamond process. [D] . Weiss, Brock Landon. 1999

机译：通过改进的微波等离子体辅助化学气相沉积金刚石工艺制造的薄膜冷阴极材料的生长，表征和电子场发射测量。
6. Thermal Damage-Free Microwave Annealing with Efficient Energy Conversion for Fabricating of High-Performance a-IGZO Thin-Film Transistors on Flexible Substrates [O] . Ki-Woong Park, Won-Ju Cho 2021

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7. Dissociation degree of SiH4 and film deposition rate under double tubed coaxial line type microwave plasma CVD. [O] . Isamu Kato, Katsumi Ebashi, Noriharu Suematsu 1987

机译：双管同轴线型微波等离子体CVD下SiH4和膜沉积速率的解离程度。
8. Substrate temperature measurement and control during thermal plasma CVD. [R] . Zhuang, Q. D., Guo, H., Han, Q. Y., 1993

机译：热等离子体CVD过程中的基板温度测量和控制。

Effect of substrate temperature on a-Si:H thin films fabricated by double tubed coaxial line type microwave plasma CVD.

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