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Surface Finishing Technology and Semiconductor Fabrication Process. Influence of Substrate and Environment on Chemically Amplified Resist.

机译：表面精加工技术和半导体制造工艺。基材和环境对化学放大抗蚀剂的影响。

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Masayuki ENDO;
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年度 1998
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1. Electrochemical Fabrication of Superhydrophobic Surfaces on Metal and Semiconductor Substrates [J] . Hua Bai, Chun Li, Gaoquan Shi Journal of Adhesion Science and Technology: The International Journal of Theoredtical and Basic Aspects of Adhesion Science and Its Applications in All Areas of Technology . 2008,第15期

机译：金属和半导体基底上超疏水表面的电化学制备
2. Study of Nanometer Resolution Resist Slope for the UVIII Chemically Amplified Resist. [J] . A. Gerardino, M. Gentili, E. Di Fabrizio Microelectronic Engineering . 1999,第1a4期

机译：UVIII化学增强抗蚀剂的纳米分辨率抗蚀剂斜率研究。
3. Analysis of Surface Finish Improvement during Ultrasonic Assisted Magnetic Abrasive Finishing on Chemically treated Tungsten Substrate [J] . Nitesh Sihag, Prateek Kala, Pulak M. Pandey Procedia Manufacturing . 2017,第4期

机译：化学处理的钨基衬底上的超声辅助磁研磨加工中表面处理改进的分析
4. Analysis of Surface Finish Improvement during Ultrasonic Assisted Magnetic Abrasive Finishing on chemically treated Tungsten substrate [C] . Nitesh Sihag, Prateek Kala, Pulak M Pandey North American Manufacturing Research Conference . 2017

机译：超声辅助磁磨料整理在化学处理过的钨基材上的表面光洁度分析
5. Novel 1.3-micron high-speed directly modulated semiconductor laser device designs and the development of wafer bonding technology for compliant-substrate fabrication. [D] . Greenberg, Joseph. 2000

机译：新型1.3微米高速直接调制半导体激光器件设计以及用于顺应性衬底制造的晶圆键合技术的发展。
6. Eighth International Workshop on Epitaxial Semiconductors on Patterned Substrates and Novel Index Surfaces [O] . Stefano Sanguinetti 2010

机译：第八届图案衬底和新型折射率表面上的外延半导体国际研讨会
7. Surface Finishing Technology and Semiconductor Fabrication Process. Influence of Silicon Substrate Surface Condition on Gate Oxide Reliability. [O] . Yoshio OZAWA, Masato FUKUMOTO, Yasumasa SUIZU 1998

机译：表面精加工技术和半导体制造工艺。硅衬底表面条件对栅极氧化物可靠性的影响。

Surface Finishing Technology and Semiconductor Fabrication Process. Influence of Substrate and Environment on Chemically Amplified Resist.

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