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Fabrication and Characterization of Thermoresponsive Films Deposited by an RF Plasma Reactor

机译：RF等离子体反应器沉积的热反应膜的制造与表征

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Adrianne E. Lucero; Jamie A. Reed; Xiaomei Wu; Heather E. Canavan;
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1. Fabrication and Characterization of Thermoresponsive Films Deposited by an RF Plasma Reactor [J] . Adrianne E. Lucero, Jamie A. Reed, Xiaomei Wu, Plasma processes and polymers . 2010,第12期

机译：射频等离子体反应器沉积的热敏膜的制备和表征
2. Surface Analysis of Plasma Deposited Polymer Films, 7: 'In situ' Characterization of Plasma Deposited Allylamine Films by ToF-SSIMS, XPS and NEXAFS Spectroscopy [J] . Umut Oran, Sufal Swaraj, Andreas Lippitz, Plasma processes and polymers . 2006,第3期

机译：等离子体沉积的聚合物薄膜的表面分析，7：通过ToF-SSIMS，XPS和NEXAFS光谱对等离子体沉积的烯丙胺薄膜进行“原位”表征
3. Growth and Characterization of Diamond Films Deposited at High-Pressure Using a Low-Power Microwave Plasma Reactor [J] . Lei Zhang, Zhibin Ma, Lifeng Wu Inorganic materials . 2011,第3期

机译：使用低功率微波等离子体反应器在高压下沉积的金刚石膜的生长和表征
4. Fabrication and characterization of photo- and plasma-chemically deposited thiol-terminated films for biomedical applications [C] . Evelyne Kasparek, Jason R. Tavares, Michael R. Wertheimer, World biomaterials congress . 2016

机译：用于生物医学应用的光化学和等离子体化学沉积的巯基封端膜的制备和表征
5. Characterization and optimization of microhardness of diamondlike carbon films deposited from RF inductively coupled plasmas [D] . Bao, Tianming 2000

机译：射频感应耦合等离子体沉积的类金刚石碳膜的表征和优化显微硬度
6. Fabrication and Characterization of Thermoresponsive Films Deposited by an RF Plasma Reactor [O] . Adrianne E. Lucero, Jamie A. Reed, Xiaomei Wu, -1

机译：RF等离子体反应器沉积的热反应膜的制造与表征
7. Fabrication and Characterization of Silicon Rich Oxide (SRO) Thin Film Deposited by Plasma Enhanced CVD for Si Quantum Dot [O] . Zhang Tian Photovoltaics Renewable Energy Engineering Faculty of Engineering UNSW 2012

机译：等离子增强CVD沉积Si量子点的富硅氧化物（SRO）薄膜的制备与表征
8. Characterization and performance of carbon films deposited by plasma and ion beam based techniques [R] . Walter, K. C., Kung, H., Levine, T. 1994

机译：基于等离子体和离子束技术沉积碳膜的表征和性能

Fabrication and Characterization of Thermoresponsive Films Deposited by an RF Plasma Reactor

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