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Effect of Pressure on the Film Deposition during RF Magnetron Sputtering Considering Charged Nanoparticles

机译：考虑带电纳米颗粒的RF磁控溅射期间压力对膜沉积的影响

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Du-Yun Kim; Ji-Hye Kwon; Gil-Su Jang; Nong-Moon Hwang;
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1. Effect of Pressure on the Film Deposition during RF Magnetron Sputtering Considering Charged Nanoparticles [J] . Du-Yun Kim, Ji-Hye Kwon, Gil-Su Jang, Coatings . 2021,第2期

机译：考虑带电纳米粒子的RF磁控溅射期间压力对膜沉积的影响
2. Influence of deposition pressure and rf power on the structure and electrical properties of Zr_(0.8)Sn_(0.2)TiO_4 thin films prepared by rf magnetron sputtering [J] . Cheng-Liang Huang, Jun-Jie Wang, Cheng-Hsing Hsu Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2007,第2期

机译：沉积压力和射频功率对射频磁控溅射制备Zr_（0.8）Sn_（0.2）TiO_4薄膜的结构和电性能的影响
3. Generation of Charged Ti Nanoparticles and Their Deposition Behavior with a Substrate Bias during RF Magnetron Sputtering [J] . Ji-Hye Kwon, Du-Yun Kim, Nong-Moon Hwang Coatings . 2020,第5期

机译：在RF磁控溅射期间产生带电Ti纳米颗粒及其沉积行为
4. Deposition of crystalline Ge nanoparticle films by high-pressure RF magnetron sputtering method [C] . D Ichida, G Uchida, H Seo, Symposium on Plasma Sciences for Materials . 2014

机译：高压RF磁控溅射法沉积结晶Ge纳米粒子膜
5. Relationship between deposition parameters and the properties of RF-magnetron sputter deposited zirconia thin films. [D] . Ruddell, David Edward. 2002

机译：沉积参数与射频磁控溅射沉积氧化锆薄膜性能之间的关系。
6. Novel Physical Vapor Deposition Approach to Hybrid Perovskites: Growth of MAPbI3 Thin Films by RF-Magnetron Sputtering [O] . Sara Bonomi, Daniela Marongiu, Nicola Sestu, -1

机译：杂化钙钛矿的新型物理气相沉积方法：通过射频磁控溅射法生长MAPbI3薄膜。
7. Investigation of the Properties of Al-doped ZnO Thin Films with Sputtering Pressure Deposition by RF Magnetron Sputtering [O] . Weiqiang Shuai, Yuehui Hu, Yichuan Chen, 2017

机译：RF磁控溅射溅射压力沉积抗氮锌薄膜性能研究

Effect of Pressure on the Film Deposition during RF Magnetron Sputtering Considering Charged Nanoparticles

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