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Printability study of pattern defects in the EUV mask as a function of hp nodes

机译：EUV掩模模式缺陷作为HP节点的函数的可印刷性研究

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Tae-Geun Kim; Hwan-Seok Seo; In-Yong Kang; Chang Young Jeong; Sungmin Huh; Jihoon Na; Seong-Sue Kim; Chan-Uk Jeon; Iacopo Mochi; Kenneth A. Goldberg;
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1. Detection of Printable EUV Mask Absorber Defects and Defect Adders by Full Chip Optical Inspection of EUV Patterned Wafers [J] . Luciana Meli, Ravi Bonam, Scott Halle, IEEE Transactions on Semiconductor Manufacturing . 2017,第4期

机译：通过EUV图案晶圆的全芯片光学检测来检测可印刷的EUV掩模吸收层缺陷和缺陷添加物
2. Inspection of EUVL mask blank defects and patterned masks using EUV photoemission electron microscopy [J] . Jingquan Lin, J. Maul, N. Weber, Microelectronic Engineering . 2008,第5a6期

机译：使用EUV光发射电子显微镜检查EUVL掩模的空白缺陷和图案化掩模
3. Study of extreme ultraviolet lithography patterned mask inspection tool for half-pitch 11-nm node defect detection performance [J] . Ryoichi Hirano, Susumu Iida, Tsuyoshi Amano, Journal of microanolithography, MEMS, and MOEMS . 2016,第2期

机译：半间距11nm节点缺陷检测性能的极紫外光刻图案化掩模检查工具的研究
4. Printability study of pattern defects in the EUV mask as a function of hp nodes [C] . Tae-Geun Kim, Hwan-Seok Seo, In-Yong Kang, Conference on extreme ultraviolet (EUV) lithography III . 2012

机译：EUV掩模中的图案缺陷作为hp节点的函数的可印刷性研究
5. Simulation and compensation methods for EUV lithography masks with buried defects. [D] . Clifford, Chris Heinz. 2010

机译：具有掩埋缺陷的EUV光刻掩模的仿真和补偿方法。
6. Functional Studies of Tyrosine Hydroxylase Missense Variants Reveal Distinct Patterns of Molecular Defects in Dopa-Responsive Dystonia [O] . Agnete Fossbakk, Rune Kleppe, Per M Knappskog, -1

机译：酪氨酸羟化酶错义变体的功能研究揭示了在多巴反应性肌张力障碍中分子缺陷的独特模式。
7. Detectability and printability of EUVL mask blank defects for the 32-nm HP node [O] . Wonil Cho, Hak-Seung Han, Kenneth A. Goldberg, 2007

机译：EUVL掩模空白缺陷对32-NM HP节点的可检测性和可打印性

Printability study of pattern defects in the EUV mask as a function of hp nodes

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