Realizing the diamond annular groove phase masks for the mid infrared region: five years of successful process development of diamond plasma etching

摘要

The Annular Groove Phase Mask (AGPM) is a circularly symmetric half wave plate consisting of a circular high aspect ratio sub-wavelength grating. Here we present a method for realizing such structures in diamond. To improve the AGPM performance, antireflective sub-wavelength gratings are etched on the backside of the components, and such gratings are also discussed. Components for the N-band (around 10 μm) and the L-band (around 3.8 μm) have been successfully fabricated. We are currently developing the process further to improve the precision of the gratings and produce an AGPM for the K-band (around 2.2 μm). © (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.