Phase measurements of EUV mask defects

机译：EUV掩模缺陷的相位测量

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Rene A. Claus; Yow-Gwo Wang; Antoine Wojdyla; Markus P. Benk; Kenneth A. Goldberg; Andrew R. Neureuther; Patrick P. Naulleau; Laura Waller;
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年度 2015
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1. Detection of Printable EUV Mask Absorber Defects and Defect Adders by Full Chip Optical Inspection of EUV Patterned Wafers [J] . Luciana Meli, Ravi Bonam, Scott Halle, IEEE Transactions on Semiconductor Manufacturing . 2017,第4期

机译：通过EUV图案晶圆的全芯片光学检测来检测可印刷的EUV掩模吸收层缺陷和缺陷添加物
2. Development of an EUV Microscope with Focused Coherent EUV Based on Coherent Diffraction Imaging Method for Defect Evaluation on an EUV Mask [J] . TETSUO HARADA, HIRAKU HASHIMOTO, TAKEO WATANABE Electronics and communications in Japan . 2018,第3期

机译：基于相干衍射成像方法聚焦EUV聚焦的EUV显微镜的EUV掩模缺陷评估
3. Actinic Mask Inspection Using an EUV Microscope: Preparation of a Mirau Interferometer for Phase-Defect Detection [J] . Kazuhiro Hamamoto, Yuzuru Tanaka, Hirotake Kawashima, Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers . 2005,第7B期

机译：使用EUV显微镜进行光化掩模检查：制备用于相缺陷检测的Mirau干涉仪
4. Phase measurements of EUV mask defects [C] . Rene A. Claus, Yow-Gwo Wang, Antoine Wojdyla, Conference on extreme ultraviolet lithography VI . 2015

机译：EUV掩模缺陷的相位测量
5. Simulation and compensation methods for EUV lithography masks with buried defects. [D] . Clifford, Chris Heinz. 2010

机译：具有掩埋缺陷的EUV光刻掩模的仿真和补偿方法。
6. Nondestructive high-resolution chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometry [O] . Michael Tanksalvala, Christina L. Porter, Yuka Esashi, 2021

机译：非破坏性高分辨率化学特异性3D纳米结构使用相位敏感的EUV成像反射测量
7. Quantitative evaluation of mask phase defects from through-focus EUV aerial images [O] . Iacopo Mochi, Kenneth A. Goldberg, Ryan Xie, 2011

机译：通过聚焦EUV航空图像的掩模相位缺陷的定量评估

Phase measurements of EUV mask defects

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