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Effect of Surface Pretreatment on Film Properties Deposited by Electro-/Electroless Deposition in Cu Interconnection

机译：表面预处理对Cu互连电/无电沉积沉积膜性能的影响

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Taeho Lim; Jae Jeong Kim;
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1. Electroless deposition of Ru films on Si substrates with surface pretreatments [J] . Jing-Yu Chen, Shiau-Lin Huang, Pu-Wei Wu, Thin Solid Films . 2013,第FEBa1期

机译：通过表面预处理将Ru膜化学沉积在Si衬底上
2. AMOUNTS OF Sn AND Pd ABSORBED BY PRETREATMENT FOR ELECTROLESS DEPOSITION AND SURFACE MORPHOLOGY OF CO-P DEPOSITS [J] . KENJI YAMAGISHI, TOMOHARU SOGA, MASAYOSHI NISHIRA 表面技術 . 1999,第4期

机译：预处理吸收的Sn和Pd的含量用于无电沉积和Co-P沉积物的表面形态
3. Properties of electroless Cu films optimized for horizontal plating as a function of deposit thickness [J] . Sharma Tanu, Bruening Ralf, Tang Cam Lai Nguyen, Microelectronic Engineering . 2015,第juna期

机译：优化的用于水平电镀的化学镀铜膜的性能与沉积厚度的关系
4. Nickel dependence of hydrogen co-deposition and nanoporosity in electrolessly deposited Cu-films [C] . Tobias Bernhard, Edith Steinhäuser, Stefan Kempa, IEEE Electronic Components and Technology Conference . 2020

机译：化学沉积铜膜中氢共沉积和纳米孔隙对镍的依赖性
5. SUPERCONDUCTING PROPERTIES OF EPITAXIAL YBa2Cu3O7-8 THIN FILMS AND YBa2Cu3O7-8/PrBa2Cu3O7-8 HETEROSTRUCTURES GROWN BY PULSED LASER DEPOSITION [D] . Inam, Arun. 1992

机译：脉冲激光沉积生长的外延YBa2Cu3O7-8薄膜和YBa2Cu3O7-8 / PrBa2Cu3O7-8异质结构的超导性能
6. The Effect of Film Thickness on the Gas Sensing Properties of Ultra-Thin TiO2 Films Deposited by Atomic Layer Deposition [O] . Rachel L. Wilson, Cristian Eugen Simion, Christopher S. Blackman, 2018

机译：膜厚对原子层沉积超薄TiO2薄膜气敏特性的影响
7. Amounts of Sn and Pd Absorbed by Pretreatment for Electroless Deposition and Surface Morphology of Co-P Deposits. [O] . Kenji YAMAGISHI, Tomoharu SOGA, Masayoshi NISHIRA, 1999

机译：通过预处理吸收的Sn和Pd的量，用于Co-P沉积物的无电沉积和表面形态。

Effect of Surface Pretreatment on Film Properties Deposited by Electro-/Electroless Deposition in Cu Interconnection

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