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Pulsed laser deposition of ITO/AZO transparent contact layers for GaN LED applications

机译:用于GaN LED应用的ITO / AZO透明接触层的脉冲激光沉积

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摘要

In this study, indium-tin oxide (ITO)/Al-doped zinc oxide (AZO) composite films were fabricated by pulsed laser deposition and used as transparent contact layers (TCLs) in GaN-based blue light emitting diodes (LEDs). The ITO/AZO TCLs were composed of the thin ITO (50 nm) films and AZO films with various thicknesses from 200 to 1000 nm. Conventional LED with ITO (200 nm) TCL prepared by E-beam evaporation was fabricated and characterized for comparison. From the transmittance spectra, the ITO/AZO films exhibited high transparency above 90% at wavelength of 465 nm. The sheet resistance of ITO/AZO TCL decreased as the AZO thickness increased, which could be attributed to the increase in a carrier concentration, leading to a decrease in the forward bias of LED. The LEDs with ITO/AZO composite TCLs showed better light extraction as compared to LED with ITO TCL in compliance with simulation. When an injection current of 20 mA was applied, the output power for LEDs fabricated with ITO/AZO TCLs had 45%, 63%, and 71% enhancement as compared with those fabricated using ITO (200 nm) TCL for the AZO thicknesses of 200, 460, and 1000 nm, respectively.
机译:在该研究中,通过脉冲激光沉积制造氧化铟锡(ITO)/ Al掺杂的氧化锌(AZO)复合膜,并用作GaN的蓝色发光二极管(LED)中的透明接触层(TCL)。 ITO / AZO TCLS由薄ITO(50nm)薄膜和偶氮膜组成,厚度为200至1000nm。用E-束蒸发制备的ITO(200nm)TCl的常规LED制备并表征进行比较。从透射光谱,ITO / AZO薄膜在465nm波长为高于90%以上的高透明度。 ITO / AZO TCL的薄层电阻随着AZO厚度的增加而降低,这可能归因于载流子浓度的增加,导致LED的前向偏差减少。使用ITO / AZO复合TCLS的LED显示出更好的光提取,与ITO TCL符合仿真的LED相比。当施加20mA的喷射电流时,与使用ITO(200nm)TCL的ITO(200nm)TCL的偶氮厚度为200时,用ITO / AZO TCLS制造的LED的输出功率具有45%,63%和71%的增强,460和1000nm。

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