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The impact of substrate bias on a remote plasma sputter coating process for conformal coverage of trenches and 3D structures

机译：基板偏置对远程等离子体溅射涂布过程的影响，用于沟槽和3D结构的保形覆盖

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H L Brown; S A Thornley; S J Wakeham; M J Thwaites; R J Curry; M A Baker;
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1. The impact of substrate bias on a remote plasma sputter coating process for conformal coverage of trenches and 3D structures [J] . Brown H. L., Thornley S. A., Wakeham S. J., Journal of Physics, D. Applied Physics: A Europhysics Journal . 2015,第33期

机译：衬底偏置对远程等离子溅射涂覆工艺的影响，以保形覆盖沟槽和3D结构
2. Conformal metal thin-film coatings in high-aspect-ratio trenches using a self-sputtered rf-driven plasma source [J] . L. Ji, J.-K. Kim, Q. Ji, Journal of Vacuum Science & Technology . 2007,第4期

机译：使用自溅射射频驱动等离子体源在高纵横比沟槽中使用共形金属薄膜涂层
3. The microstructure and mechanical properties of tantalum nitride coatings deposited by a plasma assisted bias sputtering deposition process [J] . Xu Song, Munroe Paul, Xu Jiang, Surface & Coatings Technology . 2016,第Pta1期

机译：等离子体辅助偏置溅射沉积工艺沉积氮化钽涂层的微观结构和力学性能
4. Influence of Xe ion-bombardment on the substrate microstructure and the residual stresses of TIN coatings deposited by plasma reactive sputtering onto AISI 4140 steel [C] . Thais Helena Carvalho Miranda, Sandra Vales, Erika Ochoa Becerra European Conference on Residual Stresses . 2014

机译：XE离子轰击对基质微观结构的影响及等离子体反应溅射在AISI 4140钢上沉积的锡涂层的残余应力
5. Processing, structure, and tribological property interrelationships in sputtered nanocrystalline zinc oxide coatings. [D] . Tu, Wei-Lun. 2009

机译：溅射的纳米晶态氧化锌涂层的加工，结构和摩擦学性能之间的相互关系。
6. Chemical and Morphological Characterization of Magnetron Sputtered at Different Bias Voltages Cr-Al-C Coatings [O] . Aleksei Obrosov, Roman Gulyaev, Andrzej Zak, 2017

机译：不同偏置电压Cr-Al-C涂层溅射磁控管的化学和形貌特征
7. Influence of Xe Ion-Bombardment on the Substrate Microstructure and the Residual Stresses of Tin Coatings Deposited by Plasma Reactive Sputtering onto AISI 4140 Steel [O] . Thaís Helena Carvalho Miranda, Sandra Vales, Erika Ochoa Becerra, 2014

机译：XE离子轰击对基质微观结构的影响及等离子体反应溅射在AISI 4140钢上沉积的锡涂层的残余应力
8. Statistical Study of the Combined Effects of Substrate Temperature, Bias, Annealing, and a Cr sub 3 Si sub 2 Undercoating on the Tribological Properties of RF-Sputtered MoS sub 2 Coatings [R] . Panitz, J. K. G. , Pope, L. E. , Hills, C. R. , 1987

机译：基板温度，偏压，退火和Cr sub 3 si sub 2底涂层对射频溅射mos sub 2涂层摩擦学性能的综合影响的统计研究

The impact of substrate bias on a remote plasma sputter coating process for conformal coverage of trenches and 3D structures

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