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Correction to Electroless Plating of Thin Gold Films Directly onto Silicon Nitride Thin Films and into Micropores

机译：将薄金薄膜直接校正薄金薄膜硅薄膜和微孔

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Julie C. Whelan; Buddini Iroshika Karawdeniya; Y.M. Nuwan D.Y. Bandara; Brian D. Velleco; Caitlin M. Masterson; Jason R. Dwyer;
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1. Electroless Plating of Thin Gold Films Directly onto Silicon Nitride Thin Films and into Micropores (vol 6, pg 10952, 2014) [J] . Whelan Julie C., Karawdeniya Buddini Iroshika, Bandara Y. M. Nuwan D. Y., ACS applied materials & interfaces . 2015,第46期

机译：直接在氮化硅薄膜和微孔上化学镀金薄膜（第6卷，第10952页，2014年）
2. Electroless Plating of Thin Gold Films Directly onto Silicon Nitride Thin Films and into Micropores [J] . Julie C. Whelan, Buddini Iroshika Karawdeniya, Y.M. Nuwan D.Y. Bandara ACS applied materials & interfaces . 2014,第14期

机译：直接在氮化硅薄膜和微孔上化学镀金薄膜
3. Formation of Silicon Nitride Thin Films by RF Ion Plating and Their Properties [J] . Norikazu Kanemoto, Takahiro Inoue, Takashi Daikoku, Materials Transactions, JIM . 1996,第5期

机译：射频离子镀氮化硅薄膜的形成及其性能
4. A COMPARISON OF CYANIDE AND THIOSULFATE BATHS FOR THE ELECTROLESS PLATING OF GOLD THIN FILMS [C] . A. Angstetra, M. I. Jeffrey Electrochemistry in Mineral and Metal Processing VI . 2003

机译：化学镀金薄膜的氰化物和硫代硫酸盐的比较
5. Synthesis of superconducting thin films of magnesium diboride and lead by electroless plating on conducting and non-conducting substrates. [D] . Ramasagara Nagarajan, Varun. 2008

机译：通过在导电和非导电基材上进行化学镀来合成二硼化镁和铅的超导薄膜。
6. Enhanced Electroluminescence from Silicon Quantum Dots Embedded in Silicon Nitride Thin Films Coupled with Gold Nanoparticles in Light Emitting Devices [O] . Ana Luz Muñoz-Rosas, Arturo Rodríguez-Gómez, Juan Carlos Alonso-Huitrón 2018

机译：嵌入氮化硅薄膜中的硅量子点与金纳米粒子在发光器件中的耦合增强了电致发光
7. Electroless Plating of Thin Gold Films Directly onto Silicon Nitride Thin Films and into Micropores [O] . Julie C. Whelan, Buddini Iroshika Karawdeniya, Y.M. Nuwan D.Y. Bandara, 2014

机译：将薄金薄膜的电镀直接电镀到氮化硅薄膜上并进入微孔
8. Preparation and Characterization of Hydrogenated Amorphous Silicon Thin Films and Thin Film Solar Cells Produced by Ion Plating Techniques. Final Report, 1 January 1979-31 May 1980 [R] . 1980

机译：离子镀技术制备氢化非晶硅薄膜和薄膜太阳能电池的制备与表征。最终报告，1979年1月1日至1980年5月31日

Correction to Electroless Plating of Thin Gold Films Directly onto Silicon Nitride Thin Films and into Micropores

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