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Effect of the Bilayer Period of Atomic Layer Deposition on the Growth Behavior and Electrical Properties of the Amorphous InZnO Film

机译：原子层沉积双层周期对非晶inzno膜生长性能和电学性质的影响

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1. Effect of the Bilayer Period of Atomic Layer Deposition on the Growth Behavior and Electrical Properties of the Amorphous In-Zn-O Film [J] . Lee Sangbong, Kang Yun-Ho, Kim Min-Sik, ACS applied materials & interfaces . 2020,第35期

机译：原子层沉积双层周期对无定形In-Zn-O膜的生长性能和电性能的影响
2. Effects of Deposition Conditions of First InSb Layer on Electrical Properties of n-Type InSb Films Grown With Two-Step Growth Method via InSb Bilayer [J] . Sara Khamseh, Yuichiro Yasui, Koji Nakayama, Japanese journal of applied physics . 2011,第4ISSUE2期

机译：第一InSb层的沉积条件对通过InSb双层两步生长法生长的n型InSb薄膜电性能的影响
3. Nanochemistry, nanostructure, and electrical properties of Ta_2O_5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition [J] . Diefeng Gu, Jing Li, Sandwip K. Dey, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2006,第5期

机译：通过原子层沉积和等离子体增强原子层沉积沉积的Ta_2O_5薄膜的纳米化学，纳米结构和电学性质
4. Improved Growth Behaviors and Electrical Properties of SrTiO_3 Thin Films Using the Optimized Seed Layer Deposited by Atomic Layer Deposition [C] . Sang Woon Lee, Jeong Hwan Han, Cheol Seong Hwang International symposium on silicon nitride, silicon dioxide, and emerging dielectrics;Meeting of the Electrochemical Society . 2009

机译：利用原子层沉积沉积的优化种子层改善SrTiO_3薄膜的生长行为和电性能
5. Metallorganic chemical vapor deposition and atomic layer deposition approaches for the growth of hafnium-based thin films from dialkylamide precursors for advanced CMOS gate stack applications [D] . Consiglio, Steven P. 2007

机译：金属有机化学气相沉积和原子层沉积方法，用于从二烷基酰胺前体中生长ha基薄膜，用于高级CMOS栅极堆叠应用
6. Effect of Composition Interface and Deposition Sequence on Electrical Properties of Nanolayered Ta2O5-Al2O3 Films Grown on Silicon by Atomic Layer Deposition [O] . Junpeng Li, Jianzhuo Wu, Junqing Liu, 2019

机译：组成界面和沉积顺序对原子层沉积在硅上生长的纳米Ta2O5-Al2O3薄膜电学性能的影响
7. Effects of Deposition Conditions of First InSb Layer on Electrical Properties of n-Type InSb Films Grown With Two-Step Growth Method via InSb Bilayer [O] . 前澤宏一, Khamseh Sara 2010

机译：第一Insb层沉积条件对两步生长法制备的n型Insb薄膜电性能的影响Insb双层膜

Effect of the Bilayer Period of Atomic Layer Deposition on the Growth Behavior and Electrical Properties of the Amorphous InZnO Film

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