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Radiative Cooling Characteristics of Functionally Graded Silicon Suboxide Films Prepared by Magnetron Sputtering

机译：通过磁控溅射制备的功能梯度硅杂膜膜的辐射冷却特性

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Takashi Goto; Hidetoshi Miyazaki; Hiroshi Masumoto;
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年度 2005
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1. Characteristics of graded TiO2 and TiO2/ITO films prepared by twin DC magnetron sputtering technique [J] . Wu KR, Ting CH, Wang JJ, Surface & Coatings Technology . 2006,第20a21期

机译：双直流磁控溅射技术制备渐变TiO2和TiO2 / ITO薄膜的特性
2. Distinct processes in radio-frequency reactive magnetron plasma sputter deposition of silicon suboxide films [J] . E. D. van Hattum, A. Palmero, W. M. Arnoldbik, Journal of Applied Physics . 2007,第12期

机译：射频反应磁控等离子体溅射沉积亚氧化硅膜的独特工艺
3. Experimental characterization of the deposition of silicon suboxide films in a radiofrequency magnetron reactive sputtering system [J] . van Hattum ED, Palmero A, Arnoldbik WM, Surface & Coatings Technology . 2004,第0期

机译：射频磁控反应溅射系统中低氧化硅膜沉积的实验表征
4. Experimental characterization of the deposition of silicon suboxide films in a radiofrequency magnetron reactive sputtering system [C] . E.D. van Hattum, A. Palmero, W.M. Arnoldbik, International Conference on Metallurgical Coatings and Thin Films . 2006

机译：在射频磁控激动溅射系统中硅杂膜膜沉积的实验表征
5. Texture evolution in metal nitride (aluminum nitride, titanium nitride, hafnium nitride) thin films prepared by off-normal incidence reactive magnetron sputtering . [D] . Deniz, Derya. 2008

机译：非垂直入射反应磁控溅射制备的金属氮化物（氮化铝，氮化钛，氮化ha）薄膜的织构演变。
6. Thermoelectric Characteristics of Silicon Carbide and Tungsten-Rhenium-Based Thin-Film Thermocouples Sensor with Protective Coating Layer by RF Magnetron Sputtering [O] . Zhongkai Zhang, Bian Tian, Yan Liu, 2019

机译：射频磁控溅射碳化硅和钨hen基薄膜热电偶保护涂层的热电特性
7. Electron Emission Properties of Silicon-Rich Silicon Oxide Film Prepared by Reactive Magnetron Sputtering Deposition and Rapid Thermal Annealing [O] . Yan Pang, Wei Zhao, Jie Li, 2020

机译：通过反应磁控溅射沉积和快速热退火制备的富含含硅氧化硅膜的电子发射性能

Radiative Cooling Characteristics of Functionally Graded Silicon Suboxide Films Prepared by Magnetron Sputtering

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