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Optimization of (Al, Ti) N Thin Film Formation Process by Ion Beam Assisted Deposition(Physics, Processes, Instruments Measurements)

机译：离子束辅助沉积优化（Al，Ti）N薄膜形成工艺（物理，工艺，仪器和测量）

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TAKAHASHI Yasuo; LI Shuguang; IMAKITA Tomoyuki; IMATANI Akihiro; INOUE Katsunori;
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年度 2013
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正文语种 eng
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1. Optimization of (Al,Ti)N Thin Film Formation Process by Ion Beam Assisted Deposition [J] . Yasuo TAKAHASHI, Shuguang LI, Tomoyuki IMAKITA Transactions of JWRI . 2000,第2期

机译：离子束辅助沉积优化（Al，Ti）N薄膜形成工艺
2. Properties and phase transition of (Ti,Al)N thin films prepared by ion beam-assisted deposition [J] . P. Budzynski, J. Sielanko, Z. Surowiec Intermetallics . 2008,第8期

机译：离子束辅助沉积制备（Ti，Al）N薄膜的性能和相变
3. Ion beam assisted deposition - a processing technique for preparing thin films for high-technology applications [J] . Rauschenbach B. Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2002,第1a3期

机译：离子束辅助沉积-一种用于高科技应用的薄膜制备工艺
4. AUGER ANALYSIS OF (Al, Ti)N/Si INTERFACE SYNTHESIZED BY ION BEAM ASSISTED DEPOSITION AND OPTIMIZATION OF FILM FORMATION FACTORS [C] . Yasuo TAKAHASHI, Hiroyuki ISHII, Yuji TANABE, International Symposium on Novel Materials Processing by Advanced Electromagnetic Energy Sources . 2005

机译：通过离子束辅助沉积合成的（Al，Ti）N / Si接口的螺旋钻分析和膜形成因子的优化
5. Growth, characterization and electron field emission measurements from thin film cold cathode materials fabricated by a modified microwave plasma assisted chemical vapor deposition diamond process. [D] . Weiss, Brock Landon. 1999

机译：通过改进的微波等离子体辅助化学气相沉积金刚石工艺制造的薄膜冷阴极材料的生长，表征和电子场发射测量。
6. Ion Beam Assisted Deposition of Thin Epitaxial GaN Films [O] . Bernd Rauschenbach, Andriy Lotnyk, Lena Neumann, 2017

机译：离子束辅助沉积外延GaN薄膜
7. Synthesis of hafnium oxide thin films with ion beam assisted deposition(Physics, Processes, Instruments Measurements) [O] . MORI Takanori, SHIMIZU Ippei, Manory Rafael R., 2013

机译：离子束辅助沉积法合成氧化ha薄膜（物理，过程，仪器与测量）
8. Studies on ion scattering and sputtering processes in ion beam sputter-deposition of high (Tc) superconducting films: The optimization of deposition parameters. [R] . Ameen, M. S., Kingon, A. I., Auciello, O., 1989

机译：离子束溅射沉积高（Tc）超导薄膜的离子散射和溅射工艺研究：沉积参数的优化。

Optimization of (Al, Ti) N Thin Film Formation Process by Ion Beam Assisted Deposition(Physics, Processes, Instruments Measurements)

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