首页> 外文OA文献 >New Alicyclic Polymers Based on Protected Dinorbornene Monomers for Application As Deep UV Resists.

【2h】

New Alicyclic Polymers Based on Protected Dinorbornene Monomers for Application As Deep UV Resists.

机译：基于受保护的二冰片烯单体的新型脂环族聚合物作为深紫紫外线抗蚀剂。

代理获取

本网站仅为用户提供外文OA文献查询和代理获取服务，本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文，但由于OA文献来源多样且变更频繁，仍可能出现获取不到、文献不完整或与标题不符等情况，如果获取不到我们将提供退款服务。请知悉。

页面导航

著录项
引文网络
相似文献
相关主题

著录项

作者
K.-D. Ahn; J.-H. Kang; C.-W. Lee; J.-M. Kim; D.-K. Han; J.-H. Lee; I. Cho; S.-Y. Moon; J.-S. Koo; S.-K. Lee;
展开▼
作者单位

展开▼
年度 1998
总页数
原文格式 PDF
正文语种
中图分类

相似文献

外文文献
中文文献
专利

1. Polymer waveguides from alicyclic methacrylate copolymer fabricated by deep-UV exposure [J] . Yasuhisa Ichihashi, Patric Henzi, Mathias Bruendel, Optics Letters . 2007,第4期

机译：深紫外曝光制备的脂环族甲基丙烯酸酯共聚物的聚合物波导
2. Chemical Analysis of Polymerization of Monomer Suspended in PS-MVA-LCD Polymerization and Residual Monomer Analysis of UV-Cured Monomer Suspended in Polymer Sustained (Stabilized) Molecular Vertical Alignment LCD [J] . Ritsu Kamoto SID International Symposium: Digest of Technology Papers . 2012,第3期

机译：PS-MVA-LCD悬浮的单体聚合的化学分析和聚合物（稳定的）分子垂直取向LCD悬浮的UV固化单体的残留单体分析
3. A bicyclic conjugated diene monomer, tetrahydroindene, for cationic polymerization and a novel alicyclic hydrocarbon polymer with heat resistance [J] . Mizuno N, Satoh K, Kamigaito M, Journal of Polymer Science, Part A. Polymer Chemistry . 2006,第21期

机译：用于阳离子聚合的双环共轭二烯单体四氢茚和具有耐热性的新型脂环烃聚合物
4. Chemical Analysis of Polymerization of Monomer Suspended in PS-MVA-LCD Polymerization and Residual Monomer Analysis of UV-Cured Monomer Suspended in Polymer Sustained (Stabilized) Molecular Vertical Alignment LCD [C] . Ritsu Kamoto SID International Symposium . 2012

机译：悬浮在PS-MVA-LCD聚合中悬浮的单体聚合的化学分析及悬浮在聚合物中悬浮的紫外线固化单体的残余单体分析（稳定）分子垂直对准LCD
5. Studies of the aqueous RAFT polymerization of methacrylamido-monomers and the application of their polymers in the protection and delivery of novel siRNA-based gene silencing agents. [D] . Scales, Charles Webb. 2006

机译：甲基丙烯酸酰胺基单体的水性RAFT聚合及其聚合物在新型siRNA基基因沉默剂的保护和递送中的应用研究。
6. Synthesis Based on a Preceramic Polymer and Alumina Nanoparticles via UV Lithography for High Temperature Applications [O] . Mohammed S. Almeataq, Eid M. Alosime 2020

机译：紫外光刻法合成基于陶瓷和氧化铝纳米粒子的陶瓷用于高温应用
7. Lithographic characteristics of alicyclic polymer based ArF single layer resists. [O] . Makoto Takahashi, Satoshi Takechi, Koji Nozaki, 1994

机译：基于脂环族聚合物的ARF单层抗蚀剂的光刻特性。
8. Hole Formation (Etching) in Polymers by Far (Deep) UV High Intensity Laser (Eximer) Radiation Pulses and Its Relevance to Photoresists in Deep UV Photolysis of Polymers [R] . Jellinek, H. G., Partch, R., Kacki, H. 1988

机译：远（深）紫外高强度激光（准分子）辐射脉冲在聚合物中的孔形成（蚀刻）及其与聚合物深紫外光解中光刻胶的相关性

New Alicyclic Polymers Based on Protected Dinorbornene Monomers for Application As Deep UV Resists.

著录项

引文网络

相似文献

相关主题

期刊订阅