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Structural Design of Resin Matrix and Acid-labile Dissolution Inhibitor of Chemical Amplification Positive Electron-beam Resist for Gigabit Lithography.

机译：千兆光刻化学放大阳性电子束抗蚀剂树脂基质和酸不稳定溶出剂的结构设计。

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Toshio Sakamizu; Tadasi Arai; Kohji Katoh; Shou-ichi Uchino; Fumio Murai; Yasunori Suzuki; Hiroshi Shiraishi;
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年度 1998
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1. Acid-Breakable Resin-Based Chemical Amplification Positive Resist for Electron-Beam Mastering: Design and Lithographic Performance [J] . Toshio SAKAMIZU, Hiroshi SHIRAISHI Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes . 2004,第7B期

机译：用于电子束母版的耐酸树脂基化学放大正性抗蚀剂：设计和光刻性能
2. Development of Dissolution Inhibitor in Chemically Amplified Positive Tone Thick Film Resist [J] . Sotokawa Yusuke, Nishiyama Takashi, Sato Eriko, Journal of Photopolymer Science and Technology . 2018,第3期

机译：在化学扩增的阳性厚膜抗膜抗溶解抑制剂的发展
3. Development of Dissolution Inhibitor in Chemically Amplified Positive Tone Thick Film Resist [J] . Yusuke Sotokawa, Takashi Nishiyama, Eriko Sato, Journal of Photopolymer Science and Technology . 2018,第3期

机译：化学放大正色调厚膜抗蚀剂中溶解抑制剂的研制
4. Effect of dissolution inhibitors on the dissolution characteristics of chemically amplified positive-tone electron beam resist [C] . Hideo Horibe, Mitsubishi Electric Corp., Amagasaki, Advances in Resist Technology and Processing XII . 1995

机译：溶解抑制剂对化学放大正电子束抗蚀剂溶解特性的影响
5. Exploration of non-chemically amplified resists based on dissolution inhibitors for 193 nm lithography. [D] . Baylav, Burak. 2010

机译：探索基于溶出抑制剂的非化学放大抗蚀剂，用于193 nm光刻。
6. From the Cover: Structural and biochemical studies of human proliferating cell nuclear antigen complexes provide a rationale for cyclin association and inhibitor design [O] . George Kontopidis, Su-Ying Wu, Daniella I. Zheleva, 2005

机译：从封面开始：对人类增殖细胞核抗原复合物的结构和生化研究为细胞周期蛋白缔合和抑制剂设计提供了理论依据
7. The Effect of Dissolution Inhibitors on the Dissolution Characteristics of a Chemically Amplified Three-Component Positive Resist. [O] . Hideo HORIBE, Teruhiko KUMADA, Shigeru KUBOTA 1996

机译：溶解抑制剂对化学扩增三组分正抗蚀剂溶出特性的影响。
8. Resist Materials Design: Base-Catalyzed Chemical Amplification. [R] . Willson, C. G., Cameron, J. F., MacDonald, S. A., 1994

机译：抗蚀剂材料设计：碱催化化学扩增。

Structural Design of Resin Matrix and Acid-labile Dissolution Inhibitor of Chemical Amplification Positive Electron-beam Resist for Gigabit Lithography.

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