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Dry-Developable Electron-Beam Resist. Synthesis and Resist Characteristic Evaluation of Amino-ended Poly(.ALPHA.-Methylstyrene).

机译：干开采的电子束抗蚀剂。氨基结合聚（α-甲基苯乙烯）的合成和抗蚀性评价。

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Naoki Hirakawa; Takashi Tokuda; Hidetoshi Aoki; Yukio Nagasaki; Masao Kato;
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1. Dry-Developable Electron-Beam Resist-Synthesis and Resist Characteristic Evaluationof Amino-ended by Poly(#alpha#-Methylstyrene) [J] . Naoki Hirakawa, Takashi Tokuda, Hidetoshi Aoki, Journal of Photopolymer Science and Technology . 2000,第2期

机译：干燥的电子束抗蚀剂合成和抗蚀剂的氨基结束的特征评估（＃α＃ - 甲基苯乙烯）
2. Synthesis of poly(2-trimethylsilyl-2-propyl methacrylate) and their application as a dry-developable chemically amplified photoresist [J] . Jin-Baek Kim, Hyunwoo Kim, Jae-Hak Choi Polymer: The International Journal for the Science and Technology of Polymers . 1999,第6期

机译：聚（2-三甲基甲硅烷基-2-丙基甲基丙烯酸酯）的合成及其作为可干显影的化学放大光刻胶的应用
3. Poly(ethylene glycol) as a biointeractive electron-beam resist [J] . Wang Y., Firlar E., Dai X., Journal of Polymer Science, Part B. Polymer Physics . 2013,第21期

机译：聚乙二醇作为生物相互作用电子束抗蚀剂
4. Evaluation of poly(p-trimethylsilylstyrene and p-pentamethyldisilylstyrene sulfone)s as high-resolution electron-beam resists [C] . Antoni S. Gozdz, Bell Communications Research, Red Bank, Advances in Resist Technology and Processing VIII . 1991

机译：聚（对三甲基甲硅烷基苯乙烯和对五甲基二甲硅烷基苯乙烯砜）作为高分辨率电子束抗蚀剂的评价
5. SYNTHESIS AND BASIC CHARACTERISTICS OF SEGMENTED POLY(ARYLENE ETHER SULFONE)-POLY(ARYLATE) COPOLYMERS (LIQUID CRYSTAL, ENGINEERING THERMOPLASTIC, MELT ACIDOLYSIS, ANISOTROPIC, POLYARYLENE, POLYARYLATE). [D] . LAMBERT, JAMES M. 1986

机译：分段聚（芳烃醚砜）-聚（芳酯）共聚物（液晶，工程热塑性，熔融乙酸，各向异性，聚芳基，聚芳酯）的合成及基本特性。
6. Synthesis and Characterization of Star Poly(ε-caprolactone)-b-Poly(ethylene glycol) and Poly(l-lactide)-b-Poly(ethylene glycol) Copolymers: Evaluation as Drug Delivery Carriers [O] . Fei Wang, Tatiana K. Bronich, Alexander V. Kabanov, -1

机译：星形聚（ε-己内酯）-b-聚（乙二醇）和聚（l-丙交酯）-b-聚（乙二醇）共聚物的合成和表征：评价作为药物输送载体
7. 2-Phenylally-ended Poly(.ALPHA.-Methylstyrene) Derivatives for Electron-Beam Resist. [O] . Yukio Nagasaki, Tsuyoshi Hirano, Masao Kato 1998

机译：用于电子束抗蚀剂的2-苯基结尾的聚（.alpha.-甲基苯乙烯）衍生物。
8. Poly(methyl alpha-chloracrylate) as a New Positive Electron-Beam Resist. [R] . Helbert, J. N., Cook, C. F., Poindexter, E. H. 1976

机译：聚（甲基α-氯丁酸酯）作为新的正电子束抗蚀剂。

Dry-Developable Electron-Beam Resist. Synthesis and Resist Characteristic Evaluation of Amino-ended Poly(.ALPHA.-Methylstyrene).

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