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Sensitization Distance and Acid Generation Efficiency in a Model System of Chemically Amplified Electron Beam Resist with Methacrylate Backbone Polymer

机译：甲基丙烯酸酯骨架聚合物化学放大电子束抗蚀剂模型系统中的敏化距离和酸产生效率

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Takahiro Kozawa; Seiichi Tagawa; Toshiyuki Kai; Tsutomu Shimokawa;
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年度 2007
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1. Sensitization Distance and Acid Generation Efficiency in a Model System of Chemically Amplified Electron Beam Resist with Methacrylate Backbone Polymer [J] . Takahiro Kozawa, Seiichi Tagawa, Toshiyuki Kai Journal of Photopolymer Science and Technology . 2007,第4期

机译：甲基丙烯酸甲酯骨干聚合物化学放大电子束抵抗模型系统中的敏化距离和产酸效率
2. Resolution blur of latent acid image and acid generation efficiency of chemically amplified resists for electron beam lithography [J] . Takahiro Kozawa, Seiichi Tagawa Journal of Applied Physics . 2006,第5期

机译：电子束光刻中潜酸图像的分辨率模糊和化学放大抗蚀剂的产酸效率
3. Dependence of acid generation efficiency on the protection ratio of hydroxyl groups in chemically amplified electron beam, x-ray and EUV resists [J] . Hiroki Yamamoto, Takahiro Kozawa, Atsuro Nakano, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2004,第6期

机译：产酸效率对化学放大电子束，X射线和EUV抗蚀剂中羟基保护率的依赖性
4. Basic aspects of acid generation processes in chemically amplified resists for electron beam lithography [C] . Takahiro Kozawa, Seiichi Tagawa Advances in Resist Technology and Processing XXII pt.1 . 2005

机译：用于电子束光刻的化学放大抗蚀剂中酸生成过程的基本方面
5. Electron beam induced conductivity effect of polymer resists and charging induced electron beam deflection simulation in electron beam lithography. [D] . Hwu, Justin Jia-Jen. 2000

机译：聚合物抗蚀剂的电子束感应电导率效应和电子束光刻中的电荷感应电子束偏转模拟。
6. Polymer Electrolyte Membranes Prepared by Graft Copolymerization of 2-Acrylamido-2-Methylpropane Sulfonic Acid and Acrylic Acid on PVDF and ETFE Activated by Electron Beam Treatment [O] . Xi Ke, Yufei Zhang, Uwe Gohs, 2019

机译：通过电子束处理活化的2-氟丙烯酰胺基-2-甲基丙烷磺酸和丙烯酸在PVDF和ETFE上的接枝共聚反应制备的高分子电解质膜
7. Basic Aspects of Acid Generation Processes in Chemically Amplified Electron Beam Resist [O] . Takahiro Kozawa, Seiichi Tagawa 2005

机译：化学放大电子束抗蚀剂酸产生过程的基本方面
8. Chemical Factors in the Degradation and Selective Dissolution of Methacrylate-Based Electron Beam Resist Polymers: A Nuclear Magnetic Resonance and Electron Spin Resonance Study [R] . Wagner, B. E. 1981

机译：甲基丙烯酸酯基电子束抗蚀剂聚合物降解和选择性溶解的化学因素：核磁共振和电子自旋共振研究

Sensitization Distance and Acid Generation Efficiency in a Model System of Chemically Amplified Electron Beam Resist with Methacrylate Backbone Polymer

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