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Directed Self-assembly on Sparse Chemical Patterns for Lithographic Applications

机译：针对光刻应用的稀疏化学图案的定向自组装

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Joy Y. Cheng; Alshaki Nelson; Charles T. Rettner; Daniel P. Sanders; Alexander Sutherland; Jed W. Pitera; Young-Hye Na; Ho-Cheol Kim; William Hinsberg;
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年度 2009
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1. Directed Self-assembly on Sparse Chemical Patterns for Lithographic Applications [J] . Joy Y. Cheng, Alshakim Nelson, Charles T. Rettner Journal of Photopolymer Science and Technology . 2009,第2期

机译：用于光刻应用的稀疏化学图案的定向自组装
2. Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers [J] . Joy Y. Cheng, Charles T. Rettner, Daniel P. Sanders, Advanced Materials . 2008,第16期

机译：稀疏化学图案上的密集自组装：使用嵌段共聚物对平版印刷图案进行校正和倍增
3. Chemically directed assembly of monolayer protected gold nanoparticles on lithographically generated patterns [J] . Barsotti RJ, Stellacci F Journal of Materials Chemistry: An Interdisciplinary Journal dealing with Synthesis, Structures, Properties and Applications of Materials, Particulary Those Associated with Advanced Technology . 2006,第10期

机译：在光刻产生的图案上化学指导的单层保护金纳米颗粒的化学组装
4. Ultra-fast directly self-assembly materials for sub-5 nm lithographic patterning [C] . Xuemiao Li, Chenxu Wang, Hai Deng China Semiconductor Technology International Conference . 2018

机译：超快速直接自组装材料，用于低于5 nm的光刻图案
5. Directed self-assembly of block copolymers and ternary block copolymer/homopolymer blends on chemically patterned surfaces into device-oriented geometries. [D] . Stoykovich, Mark P. 2007

机译：嵌段共聚物和三元嵌段共聚物/均聚物共混物在化学图案化表面上的定向自组装成面向装置的几何形状。
6. Self-assembly of lithographically patterned nanoparticles [O] . Jeong-Hyun Cho, David H. Gracias -1

机译：自组装光刻构图的纳米颗粒的
7. Geometric Control of Chemically Nano-patterned Substrates for Feature Multiplication Using Directed Self-Assembly of Block Copolymers [O] . Paulina A. Rincon Delgadillo, Roel Gronheid, Christopher J. Thode, 2012

机译：用嵌段共聚物的定向自组装，具有特征倍增的化学纳米图案底物的几何控制

Directed Self-assembly on Sparse Chemical Patterns for Lithographic Applications

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